Surface processing and laser assisted chemistry: proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990
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| Format: | Conference Proceeding Book |
|---|---|
| Language: | English |
| Published: |
Amsterdam
North-Holland
1990
|
| Series: | European materials research society symposia proceedings
18 |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Item Description: | Literaturangaben. - Aus: Applied surface science ; 46 |
| Physical Description: | XV, 476 S. Ill., graph. Darst. |
| ISBN: | 0444889477 |
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MARC
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| 245 | 1 | 0 | |a Surface processing and laser assisted chemistry |b proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 |c ed. by I. W. Boyd ... |
| 264 | 1 | |a Amsterdam |b North-Holland |c 1990 | |
| 300 | |a XV, 476 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a European materials research society symposia proceedings |v 18 | |
| 500 | |a Literaturangaben. - Aus: Applied surface science ; 46 | ||
| 650 | 4 | |a Lasers in chemistry |v Congresses | |
| 650 | 4 | |a Surfaces (Technology) |v Congresses | |
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| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1990 |z Straßburg |2 gnd-content | |
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| 700 | 1 | |a Boyd, Ian W. |e Sonstige |4 oth | |
| 711 | 2 | |a Symposium on Surface Processing and Laser Assisted Chemistry |d 1990 |c Straßburg |j Sonstige |0 (DE-588)5026411-4 |4 oth | |
| 830 | 0 | |a European materials research society symposia proceedings |v 18 |w (DE-604)BV004201591 |9 18 | |
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| _version_ | 1804119808692715520 |
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| adam_text | CONTENTS
Preface vii
Conference organisation
ix
Supporting organisations and sponsors
x
PART I. PRECURSORS FOR SURFACE PROCESSING
New metallo-organic precursors for surface processing
D.C. Bradley
1
Design and synthesis of CVD precursors to thin film ceramic materials
L.V.
Interrante,
В.
Han, J.B.
Hudson
and C.
Whìtmarsh
5
The photolytic laser
chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor
pressure, light intensity, and laser beam diameter
D. Braichotte, C.
Garrido
and H. van den Bergh
9
Photoprocesses in organometallics
R. Larciprete
19
Preferential (111) orientation of ZnSe on
(100)
GaAs deposited by laser-induced MOCVD
J. Simpson and J.O. Williams
27
The adsorption of triethylgaffium on GaAs(100) at
300
K: adsorption kinetics from optical second harmonic
generation transients
ME. Pemble, J.T. Allen,
D.S.
Buhaenko, S.M. Francis,
P.A.
Goulding, J. Lee and M.J. Parrott
32
Photoreactions of adsorbed CH3Br on Pt(lll)
G. Radhakrishnan, W. Stenzel, H. Conrad and A.M. Bradshaw
36
Second harmonic generation of CC^-laser radiation and FTIR spectroscopy for resonant desorption in the
adsórbate CO-NaClflOO)
J.
Heidberg,
В.
Brase, K.-W. Stahmer and M. Suhren
44
PART II. DEPOSITION
II-l. SUPERCONDUCTORS
High-ÏJ.
YBa2Cu3O7_j prepared by chemical vapour deposition
F. Schmaderer, R. Huber, H. Oetzmann and G.
Wahl 53
Deposition, characterization, and laser ablation patterning of YBCO thin films
P. Vase, Shen Yueqiang and T. Freltoft
61
Computer-controlled ion beam deposition systems for high
7^
superconductor and other multi-component oxide
thin films and layered structures
A.R. Krauss, O. Auciello, A.I. Kingon, M.S. Ajneen, Y.L, Liu,
T. Barr,
T.M. Graettmger, S.H. Rou,
C.S.
Soble and
D.M.
Gruen
67
High quality YBa^^O, ultra-thin films and Y/Pr/Y multilayers made by a modified RF-magnetron
sputtering technique
J.
Gao,
W.A.M.
Aarnink,
G J.
Gerritsma and H. Rogalla
74
Characterization of the KrF laser-induced plasma plume created above an YBaCuO superconducting target and
preparation of superconducting thin films
C. Girauit, D. Damiani, C. Champeaux, P. Marchet, C. Germain, J.P.
Mercurio,
J. Aubreton and A.
Catherinot
78
Contents
Laser-ablation deposition of uniform thin films of Bi2Sr2CaCu2O,
A. Sajijadi. K. Kuen-Lau,
F. Saba, F.
Beech and I.W. Boyd
84
An investigation of laser ablation and deposition of Y-Ba-Cu-O in an oxygen environment
P.E.
Dyer,
A. Issa
and P.H. Key
89
И-2.
METALS
Simulation of laser CVD
G.
Wahl
and H. Esrom
96
Gas-phase transport and kinetics in pulsed-laser CVD
L.
Konstan
tinov, R.
Nowak
and P. Hess
102
High performance contact formation in LSI circuit restructuring using visible pulse laser induced ablation and
CVD
Y. Morishige, S. Kitamura and S. Kishida
108
Laser-assisted deposition for electronic packaging applications
A. Bauer, J.
Ganz,
К.
Hesse and E.
Köhler 113
Multichip packaging for very-high-speed digital systems
A.F.
Bernhardt,
A.T. Barfknecht,
RJ.
Contolini,
V. Malba,
S.T. Mayer, N.F. Raley and D.B. Tuckerman
121
Optimization of the laser-induced deposition technique for its application in X-ray mask repair
R. Putzar, H.-C. Petzold and H. Staiger
131
HF formation in laser-induced CVD of tungsten
AJ.P. van
Maaren,
R.L.
Krans
and W.C.
Sinke 138
Laser direct writing of copper on various thin-film substrate materials
H.G.
Müller,
К.
Buscnick,
S.
Schuler
and
Α.
Paredes
143
Direct
writing of conducting traces by chemical modification of solid coatings with laser radiation
M.
Bode, E.W.
Kreutz and M.
Krösche 148
VUV synchrotron radiation processing of thin palladium acetate spin-on films for metallic surface patterning
Y. Zhang and M. Stuke
153
Investigation of the mechanism of the UV-induced palladium deposition process from thin solid palladium
acetate films
H. Esrom and U. Kogelschatz
158
Laser evaporation of metal sandwich layers for improved
1С
metallization
R. Pielmeier, D. Bollmann and K. Haberger
163
II-3. INSULATORS AND REFRACTORY MATERIALS
Filling of Si oxide into a deep trench using digital CVD method
Y. Horiike, T. Ichihara and H. Sakaue
168
Photo-assisted deposition of thin films on III—V semiconductors with UV and
IR
lamps
Y.I. Nissim, J.M. Moison, F. Houzay,
F. Lebland,
С.
Licoppe and M. Bensoussan
175
SiO2 deposition by direct photolysis at
185
am of N2O and SiH4
M. Petitjean,
N.
Proust, J.-F. Chapeaublanc and J. Perrin
189
Deposition of SiO2 by reactive excimer laser ablation from a SiO target
E. Fogarassy, A. Slaoui. C.
Fuchs
and J.P. Stoquert
195
Sol-gel low-temperature preparation of silica films: RBS,
ТЕМ
and
MOS C- V
characterization
A. Boelle, J.A. Roger,
В.
Canut, J.
Mugnier and
M. Pitaval
200
Gas
mixture
dependence of the LCVD of SiO2 films using an ArF laser
T.
Szörényi,
P.
González,
D.
Fernández,
S. Pou,
В.
León
and M.
Pérez-Amor
206
Contents
Excimer laser deposition of silica films: a comparison between two methods
B.
León,
A, Klumpp, M.
Pérez-Amor
and H.
Sigmund 210
Photochemical vapor deposition of titaniumdiboride
J. Elders, D. Bebelaar and J.D.W. van Voorst
215
In situ formation of ionic carbide clusters by laser ablation
R. Teghil,
A. Giardini-Guidoni,
S.
Piccirillo, A. Mele
and F. Polla-Mattiot 220
Synthesis of
ultrafine
TiO2 powders by a CW CO2 laser
F. Curcio, M.
Musei,
N. Notaro
and
G. De
Michele
225
Π-4.
SEMICONDUCTORS
On the role of the substrate position in the CO2 laser CVD of amorphous hydrogenated silicon
E.
Golusda,
R.
Lange, G.
Mollekopf
and H.
Stafast
230
Laser CVD of a-Si:H
from
SiH4
and
Si2H6:
relations between chemistry, growth rate and film properties
K. Hesch, P. Hess, H. Oetzmann and
С
Schmidt
233
Picosecond YAG laser
photoablation
of amorphous silicon
W. Marine, J.M.
Scotto
D Aniello and J. Marfaing
239
The influence of deposition parameters on the growth of a-SiGe:H alloys in a plasma CVD system
M. Zeman,
I.
Ferreira,
M.J. Geerts and J.W.
Metselaar
245
Good-quality Ge films grown by excimer laser deposition
C.N.
Afonso,
R.
Serna,
F. Catalina and D.
Bermejo
249
PART
III.
DESORPTION,
ABLATION, ETCHING AND PATTERNING
Industrial laser applications
F.G.
Bachmann 254
Surface modifications of
říapton
and cured polyimide films by ArF excimer laser: applications to imagewise
wetting and metallization
H. Hiraoka and S.
Lazare
264
Excimer laser ablation of polyimide
G.
Ulmer,
В.
Hasselberger, H.-G.
Busmann
and E.E.B. Campbell
272
Photochemically assisted laser ablation of doped polymethyl-methacrylate
M.
Bolie, K.
Luther, J.
Troe,
J. Ihlemann and H.
Gerhardt 279
Picosecond time-resolved laser desorption
N.
Eleftheriadis, H.-P. Ludescher, M.
Süssbauer
and D.
von der
Linde
284
Mechanisms of photon-stimulated desorption and chemisorption of atomic particles on the surfaces of
semiconductors and metals
A.I. Agafonov and T.M. Makhviladze
288
Surface temperature measurements using pyrometry during excimer laser pulsed etching of silicon in a Cl2
environment
T.S. Bailer, J.C.S. Kools and J. Dieleman
292
Reactive ion beam etching of Si/SiO2 systems using SF6/O2 chemistry
D. Korzec, T.
Kessler
and J.
Engemann 299
On the two- and three-dimensional simulation of ion-milled structures
H.M.
Hütten,
K.-D. Raddatz, M.K. Sharma and J.
Engemann 306
Spectroscopic study of the plasma created by interaction between a TEA CO2 laser beam and
a Ti
target in a
cell containing helium gas
J. Hermann, C. Boulmer-Leborgne and B. Dubreuil
315
Luminescence and
ESCA
analysis of laser-ablated materials
A. Giardini-Guidoni,
A. Morone, M. Snels, E. Desimoni, A.M.
Salvi,
R.
Fantoni,
W.C.M. Berden
and
M.
Giorgi
321
Contents
PART
IV. PHOTON
AND ION SURFACE MODIFICATIONS
Controlled structuring of polymer surfaces by UV-laser irradiation
W. Resting, T.
Bahners
and E.
Schollmeyer 326
Ion-beam-assisted formation of interconnections into high temperature polymers
J. Davenas,
G. Boiteux,
J.M.
Bureau and D. Broussoux
330
Laser-induced photochemical adherence enhancement
J.
Breuer,
S.
Metev,
G.
Sepold, O.-D.
Hennemann,
H.
Kollek
and
G.
Krüger 336
Applications
of doping
and
dedoping
of Teflon
AF
films in
microfabrication
using KrF and ArF excimer lasers
H. Hiraoka and
S. Lazare
342
Ultra-flat
p
-η
junctions formed by solid source laser doping
G. Stock, D. Bollmann, R.
Büchner,
G.
Neumayer
and
К.
Haberger 348
Low temperature VUV enhanced growth of thin silicon dioxide films
P.
Patel
and I.W. Boyd
352
Chemical reactions at solid-solid interfaces induced by pulsed laser annealing
E.J. Petit and R. Caudano
357
Nitridation of titanium by multipulse excimer laser irradiation
E. D Anna, G.
Leggieri,
Α.
Luches,
M.
Martino, A.
V.
Drigo, G.
Majni,
P. Mengucci and I.N. Mihailescu
365
Annealing kinetics during rapid thermal processing of excimer laser-induced defects in virgin silicon
B. Hartiti, A. Slaoui, J.C.
Muller
and P. Siffert
371
Influence of the substrate on the temperature induced by pulsed laser irradiation of thin films
A. Jadin,
I.V.
Filiouguine, M. Wautelet and L.D.
Laude
375
Pulsed excimer and Nd:YAG laser crystallization of a-Si:H. The specific role of hydrogen
M. Elliq, E. Fogarassy, J.P. Stoquert, C.
Fuchs,
S. de
Unamuno,
В.
Prévôt and H.
Pattyn
378
The influence of the substrate on the transformations induced in Si by nanosecond laser irradiation: a
time-resolved study
J.
Solis,
C.N.
Afonso
and
F. Catalina 383
Investigation of laser recrystallization of thin Si films using numerical simulation
B. Hu,
A. Seidl,
R.
Buchner,
D. Bollmann, W.
van
der
Wel
and K.
Haberger 388
Time-resolved
ТЕМ
of laser-induced structural changes in GeTe films
0. Bostanjoglo and P. Thomsen-Schmidt
392
Thermal evolution of W/Si and W/C multilayers under pulsed laser heating and classical annealing
V. Dupuis, M.F. Ravet,
C. Tête
and M.
Piecuch
398
Diffusion and
microstructures
induced by excimer laser irradiation in Ge-Sb thin film bilayers
R.
Serna,
C.N.
Afonso,
F. Catalina, N.
Teixeira,
M.F. da Silva and
J.C. Soares
405
Morphological improvement of zinc electrodeposits by laser assistance
1. Zouari, M.
Calvo,
F.
Lapicque and M. Cabrera
411
CW laser-induced transformation of thin Sb,
Se
and SbjSe3 films in air
K. Kolev, M. Wautelet and L.D.
Laude
418
Instability and structural transformation of amorphous ultra-thin W—Si multilayer structures during heavy ion
irradiation
J. Marfaing, W. Marine,
B. Vidal, M.
Toulemonde,
M.
Hage
Ali and J.P. Stoquert
422
Crystallization of Fe-Zr metallic glasses during ion irradiation
L.-U.A. Andersen and J.
Bettiger 427
Glass surface treatment with excimer and CO2 lasers
C. Buerhop, B.
Blumenthal,
R.
Weissmann, N.
Lutz
and S.
Biermann 430
Contents
PART V.
ADVANCED
TECHNIQUES OF CHARACTERISATION
Hydrogen plasma treatment of silicon surfaces studied by in-situ
spectroscopie ellipsometry
P. Raynaud, J.P. Booth and C. Pomot
435
Scanning tunneling microscopy and technical applications
H.
Strecker
and G. Persch
441
Femtosecond transient reflectivity measurements as a probe for process-induced defects in silicon
A. Esser,
W.
Kiitt,
M.
Strähnen,
G.
Maidorn
and H.
Kurz 446
In situ
silicon
solid
state regrowth kinetics measurement
in
a
rapid
thermal processor
J.-M. Dilhac,
N.
Nolhier and C. Ganibal
451
Author index
455
Subject index
461
Applied
Surface
Science
46 (1990) 455-460
North-Holland
455
Author index
Aarnink, W.A.M., see
Gao
46 (1990) 74
Afonso,
C.N.,
R.
Serna,
F.
Catalina
and
D,
Bermejo,
Good-quality Ge films
grown by excimer laser deposition
46 (1990) 249
Afonso, C.N.,
see
Solis
46 (1990) 383
Afonso, C.N.,
see
Serna
46 (1990) 405
Agafonov,
АЛ.
and
T.M. Makhviladze,
Mechanisms of photon-stimulated de-
sorption and chemisorption of atomic
particles on the surfaces of semicon¬
ductors and metals
46 (1990) 288
Allen, J.T., see Pemble
46 (1990) 32
Ameen, M.S., see Krauss
46 (1990) 67
Andersen, L.-U.A. and J.
Bottiger,
Crys¬
tallization of Fe-Zr metallic glasses
during ion irradiation
46 (1990) 427
Aubreton, J., see Girault
46 (1990) 78
Auciello, O., see Krauss
46 (1990) 67
Bachmann, F.G.,
Industrial laser applica¬
tions
46 (1990) 254
Banners,
T.,
see Resting
46 (1990) 326
Bailer, T.S., J.C.S. Kools and J. Dieleman,
Surface temperature measurements
using pyrometry during excimer laser
pulsed etching of silicon in a Cl2 en¬
vironment
46 (1990) 292
Barfknecht, A.T., see
Bernhardt 46 (1990) 121
Barr,
T.,
see Krauss
46 (1990) 67
Bauer,
Α.,
J.
Ganz,
К.
Hesse and E.
Köhler,
Laser-assisted deposition for
electronic packaging applications
46 (1990) 113
Bebelaar, D.,
see Elders
46 (1990) 215
Beech,
F.,
see Sajjadi
46 (1990) 84
Bensoussan, M., see Nissim
46 (1990) 175
Berden, W.C.M.,
see
Giardini-Guidoni
46 (1990) 321
Bermejo,
D.,
see
Afonso
46 (1990) 249
Bernhardt, A.F., A.T. Barfknecht, RJ.
Contolini,
V. Malba,
S.T. Mayer, N.F.
Raley and D.B. Tuckerman, Multichip
packaging for very-high-speed
digital
systems
46 (1990) 121
Biermann,
S.,
see Buerhop
46 (1990) 430
Blumenthal,
В.,
see Buerhop
46 (1990) 430
Bode, M., E.W. Kreutz and M.
Kxösche,
Direct writing of conducting traces by
chemical modification of solid coat¬
ings with laser radiation
46 (1990) 148
Boelle,
Α.,
J.A. Roger, B. Canut,
Ì.
Mugnier and M. Htaval, Soi-gel low-
temperature preparation of silica
films: RBS,
ТЕМ
and
MOS
C-V
characterization
46 (1990) 200
Boiteux, G.,
see Davenas
46 (1990) 330
Bolle,
M.,
К.
Luther, J.
Troe,
J. Ihlemann
and H.
Gerhardt, Photochemically
as¬
sisted
laser
ablation of doped poly-
methyl-methacrylate
46 (1990) 279
Bollmann, D., see Pielmeier
46 (1990) 163
Bollmann, D., see Stock
46 (1990) 348
Bollmann, D., see Hu
46 (1990) 388
Booth, J.P., see Raynaud
46 (1990) 435
Bostanjoglo, O. and P. Thomsen-Schmidt,
Time-resolved
ТЕМ
of laser-induced
structural changes in GeTe films
46 (1990) 392
B0ttiger, J., see Andersen
46 (1990) 427
Boulmer-Leborgne, C, see Hermann
46 (1990) 315
Boyd, I.W., see Sajjadi
46 (1990) 84
Boyd, I.W., see
Patel
46 (1990) 352
Bradley, D.C., New metallo-organic pre¬
cursors for surface processing
46 (1990) 1
Bradshaw, A.M., see Radhakrishnan
46 (1990) 36
Braichotte, D., C.
Garrido
and H. van
den Bergh, The photolytic laser chem¬
ical vapor deposition rate of platinum,
its dependence on wavelength, pre¬
cursor vapor pressure, light intensity,
and laser beam diameter
46 (1990) 9
Brase,
В.,
see
Heidberg 46 (1990) 44
Breuer,
J.,
S. Metev, G. Sepold, O.-D.
Hennemann,
H.
Kollek
and G.
Krüger,
Laser-induced photochemical adher¬
ence enhancement
46 (1990) 336
Broussoux, D., see Davenas
46 (1990) 330
Büchner,
R.,
see Stock
46 (1990) 348
Büchner,
R.,
see
Hu
46 (1990) 388
Buerhop,
С, В.
Blumenthal, R. Weiss¬
mann, N. Lutz
and S.
Biermann,
Glass
surface treatment with excimer and
CO, lasers
46 (1990) 430
Buhaenko,
D.S.,
see Pemble
46 (1990) 32
Bureau, J.M., see Davenas
46 (1990) 330
Buschick, K., see
Müller 46 (1990) 143
Busmann,
H.-G., see Ulmer
46 (1990) 272
Cabrera, M., see Zouari
46 (1990) 411
Calvo,
M.,
see Zouari
46 (1990) 411
Campbell, E.E.B., see Ulmer
46 (1990) 272
Canut,
В.,
see Boelle
46 (1990) 200
Catalina, F.,
see
Afonso
46 (1990) 249
Catalina, F.,
see
Solis
46 (1990) 383
Eisevier
Science
Publishers B.V. (North-Holland)
456
A uthor index
Catalina, F.,
see
Sema
46 (1990) 405
Catherinot,
Α.,
see Girault
46 (1990) 78
Caudano, R.. see Petit
46 (1990) 357
Champeaux, C, see Girault
46 (1990) 78
Chapeaublanc, J.-R, see Petitjean
46 (1990) 189
Conrad, H., see Radhakrishnan
46 (1990) 36
Contolini, R.J., see
Bernhardt 46 (1990) 121
Curcio,
F.,
M.
Musei,
N. Notaro
and G.
De Michele,
Synthesis of ultrafine
TiO2 powders by a CW CO2 laser
46 (1990) 225
Da Silva, M.F.,
see
Serna
46 (1990) 405
Damiani, D., see Girault
46(1990) 78
D Anna, E.,
G.
Leggieri,
A. Luches,
M.
Martino, A.
V. Drigo,
G.
Majni,
P.
Mengucci
and I.N. Mihailescu, Nitri-
dation
of titanium
by multipulse ex-
cimer laser
irradiation
46 (1990) 365
Davenas, J.,
G. Boiteux,
J.M. Bureau
and
D. Broussoux,
Ion-beam-assisted for¬
mation of interconnections into high
temperature polymers
46 (1990) 330
De Michele,
G.,
see Curcio
46 (1990) 225
De Unamuno, S.,
see Elliq
46 (1990) 378
Desimoni, E., see
Giardini-Guidoni
46 (1990) 321
Dieleman, J., see Bailer
46 (1990) 292
Dilhac, J.-M.,
N.
Nolhier and
С
Ganibal,
In situ silicon solid state regrowth
kinetics measurement in a rapid ther¬
mal processor
46 (1990) 451
Drigo, A.V., see
D Anna
46 (1990) 365
Dubreuil,
В.,
see Hermann
46 (1990) 315
Dupuis, V., M.F. Ravet,
С
Tête
and
M.
Piecuch, Thermal evolution of W/Si
and W/C multilayers under pulsed
laser heating and classical annealing
46 (1990) 398
Dyer,
P.E.,
A. Issa
and P.H. Key, An
investigation of laser ablation and de¬
position of Y-Ba-Cu-O in an oxygen
environment
46(1990) 89
Elders, J., D. Bebelaar and J.D.W. van
Voorst, Photochemical vapor deposi¬
tion of titaniumdiboride
46(1990)215
Eleftheriadis, N., H.-P. Ludescher, M.
Siissbauer and D.
von der
Linde,
Pico¬
second time-resolved laser desorption
46 (1990) 284
Elliq, M., E. Fogarassy, J.P. Stoquert,
C.
Fuchs,
S. de
Unamuno,
В.
Prévôt
and H.
Pattyn, Pulsed excimer and
Nd:YAG laser crystallization of a-
Si:H. The specific role of hydrogen
46 (1990) 378
Engemann,
J., see Korzec
46 (1990) 299
Engemann,
J.,
see
Hütten 46 (1990) 306
Esrom,
R,
see
Wahl 46(1990) 96
Esrom,
H.
and
U.
Kogelschatz, Investiga¬
tion of the mechanism of the UV-in-
duced palladium deposition process
from thin solid palladium acetate films
46 (1990) 158
Esser,
Α.,
W.
Kütt,
M.
Strähnen,
G.
Maidorn
and H.
Kurz,
Femtosecond
transient reflectivity measurements as
a probe for process-induced defects in
silicon
46 (1990) 446
Fantoni, R.,
see
Giardini-Guidoni
46 (1990) 321
Fernández,
D.,
see
Szörényi
46 (1990) 206
Ferreira,
I., see
Zeman
46 (1990) 245
Filiouguine,
I.V.,
see
Jadin 46 (1990) 375
Fogarassy,
E.,
A. Slaoui,
С.
Fuchs
and
J.
P. Stoquert, Deposition of SiO2 by
reactive excimer laser ablation from a
SiO target
46 (1990) 195
Fogarassy, E., see Elliq
46 (1990) 378
Francis, S.M., see Pemble
46 (1990) 32
Freltoft,
T.,
see Vase
46 (1990) 61
Fuchs,
С,
see Fogarassy
46 (1990) 195
Fuchs,
С,
see Elliq
46 (1990) 378
Ganibal, C, see Dilhac
46 (1990) 451
Ganz,
J., see Bauer
46 (1990) 113
Gao,
J., W.A.M. Aarnink, G.J. Gerritsma
and H. Rogalla, High quality YBa2-
Οι30,
ul
tra-
thin films and Y/Pr/Y
multilayers made by a modified RF-
magnetron sputtering technique
46 (1990) 74
Garrido,
С,
see Braichotte
46 (1990) 9
Geerts, M.J., see
Zeman
46 (1990) 245
Gerhardt,
H.,
see
Bolle
46 (1990) 279
Germain,
С,
see Girault
46 (1990) 78
Gerritsma, G.J., see
Gao
46 (1990) 74
Giardini-Guidoni,
Α.,
see Teghil
46 (1990) 220
Giardini-Guidoni,
Α.,
A. Morone, M.
Snels,
E.
Desimoni,
A.M.
Salvi, R.
Fantoni,
W.C.M. Berden and M.
Giorgi,
Luminescence and
ESCA
analysis of laser-ablated materials
46 (1990) 321
Giorgi,
M.,
see
Giardini-Guidoni
46 (1990) 321
Girault,
C, D.
Damiani,
С.
Champeaux,
P. Marchet,
С
Germain, J.P.
Mercu¬
rio,
J.
Aubreton and A. Catherinot,
Characterization of the KrF laser-in¬
duced plasma plume created above an
YBaCuO superconducting target and
preparation of superconducting thin
films
46(1990) 78
Golusda,
E., R.
Lange, G. Mollekopf
and
H.
Stafast,
On
the role of the substrate
position in the CO2 laser CVD of
amorphous hydrogenated silicon
46 (1990) 230
González,
P., see
Szörényi
46 (1990) 206
Goulding,
P.A.,
see Pemble
46 (1990) 32
Graettinger, T.M., see Krauss
46 (1990) 67
Gruen,
D.M.,
see Krauss
46 (1990) 67
Author index
457
Haberger.
К.,
see Pielmeier
46 (1990) 163
Haberger,
К.,
see Stock
46 (1990) 348
Haberger,
К.,
see
Hu
46 (1990) 388
Hage Ali,
M.,
see Marfaing
46 (1990) 422
Han,
В.,
see
Interrante
46 (1990) 5
Haniti,
В.,
A. Slaoui, J.C.
Muller
and P.
Siffert, Annealing kinetics during
rapid thermal processing of excimer
laser-induced defects in virgin silicon
46 (1990) 371
Hasselberger,
В.,
see
Ulmer 46 (1990) 272
Heidberg,
J..
В.
Brase. K.-W. Stahmer
and M. Suhren, Second harmonic gen¬
eration of CC^-laser radiation and
FTIR spectroscopy for resonant de-
sorption in the
adsórbate
CO-NaCl-
(100) 46(1990) 44
Hennemann, O.-D.,
see
Breuer 46 (1990) 336
Hermann, J., C. Boulmer-Leborgne and
B. Dubreuil,
Spectroscopie
study of
the plasma created by interaction be¬
tween a TEA CO2 laser beam and
a Ti
target in a cell containing helium gas
46 (1990) 315
Hesch, K., P. Hess. H. Oetzmann and
С
Schmidt, Laser CVD of a-Si:H from
SiH4 and Si2H6: relations between
chemistry, growth rate and film prop¬
erties
46 (1990) 233
Hess, P., see
Konštantínov
46 (1990) 102
Hess, P., see Hesch
46 (1990) 233
Hesse, K... see Bauer
46(1990)113
Hiraoka, H. and S.
Lazare,
Surface mod¬
ifications of Kapton and cured poly-
irnide films by ArF excimer laser: ap¬
plications to imagewise wetting and
metallization
46 (1990) 264
Hiraoka, H. and S.
Lazare.
Applications
of doping and
dedoping
of Teflon AF
films in
microfabrication
using ICrF
and ArF excimer lasers
46 (1990) 342
Horiike, Y., T. Ichihara and H. Sakaue,
Filling of Si oxide into a deep trench
using digital CVD method
46 (1990) 168
Houzay,
F.,
see Nissim
46(1990)175
Ни, В.,
A. Seidl,
R.
Buchner,
D. Boll-
mann, W.
van der Wel and
K. Ha-
berger,
Investigation of
laser reerys-
tallization of thin Si films using
numerical simulation
46 (1990) 388
Huber, R., see Scnmaderer
46 (1990) 53
Hudson,
JB.,
see
Interrante
46 (1990) 5
Hutten, H.M.,
K.-D. Raddatz, M.K.
Sharma and J.
Engemann,
On the two-
and three-dimensional simulation of
ion-milled structures
46 (1990) 306
ichihara,
T.,
see Horiike
46 (1990) 168
Ihlemann, J., see
Bolle
46 (1990) 279
Interrante,
L.V., B.
Han, J.B.
Hudson and
С.
Whitmarsh, Design and synthesis
of CVD precursors to thin film ceramic
materials
46 (1990) 5
Issa,
Α.,
see Dyer
46 (1990) 89
Jadin,
Α.,
I.V.
Filiouguine, M. Wautelet
and L.D.
Laude,
Influence of the sub¬
strate on the temperature induced by
pulsed laser irradiation of thin films
46 (1990) 375
Kessler,
T.,
see Korzec
46 (1990) 299
Kesting, W., T.
Bahners
and E. Scholl-
meyer, Controlled structuring of poly¬
mer surfaces by UV-laser irradiation
46 (1990) 326
Key, P.H., see Dyer
46 (1990) 89
Kingon, A.I., see Krauss
46 (1990) 67
Kishida, S., see Morishige
46 (1990) 108
Kitamura, S., see Morishige
46 (1990) 108
Klumpp,
Α.,
see
León
46 (1990) 210
Kogelschatz, U., see Esrom
46 (1990) 158
Köhler,
E.,
see Bauer
46 (1990) 113
Kolev, K., M. Wautelet and L.D.
Laude,
CW laser-induced transformation of
thin Sb,
Se
and Sb2Se3 films in air
46 (1990) 418
Kollek,
Η.,
see
Breuer 46 (1990) 336
Konštantínov, L., R.
Nowak
and P.
Hess,
Gas-phase transport and kinetics in
pulsed-laser CVD
46 (1990) 102
Kools, J.C.S., see Bailer
46 (1990) 292
Korzec, D., T.
Kessler
and J.
Engemann,
Reactive ion beam etching of Si/SiO2
systems using SF6/O2 chemistry
46 (1990) 299
Krans, R.L.,
see Van
Maaren 46 (1990) 138
Krauss, A.R., O. Auciello, A.I. Kingon,
M.S. Ameen, Y.L. Liu,
T. Barr, T.M.
Graettinger,
S.H.
Rou,
CS.
Sobie
and
D.M.
Gruen, Computer-controlled ion
beam deposition systems for high Tc
superconductor and other multi-com¬
ponent oxide thin films and layered
structures
46(1990) 67
Kreutz, E.W., see Bode
46 (1990) 148
Krösche,
M.,
see Bode
46 (1990) 148
Krüger,
G.,
see
Breuer 46 (1990) 336
Kuen-Lau,
К.,
see Sajjadi
46 (1990) 84
Kurz, H.,
see
Esser
46 (1990) 446
Kiitt,
W.,
see
Esser
46 (1990) 446
Lange,
R.,
see
Golusda 46 (1990) 230
Lapicque,
F.,
see Zouari
46 (1990) 411
Larciprete, R., Photoprocesses in organo-
metallics 46(1990) 19
Laude, L.D.,
see
Jadin 46 (1990) 375
Laude, L.D.,
see
Kolev 46 (1990) 418
Lazare, S.,
see
Hiraoka
46 (1990) 264
Lazare, S.,
see
Hiraoka
46 (1990) 342
458
А итог
index
Lebland, F.,
see Nissim
46 (1990) 175
Lee,
J.,
see Pemble
46 (1990) 32
Leggieri, G., see
D Anna
46 (1990) 365
León,
В.,
see
Szörényi
46 (1990) 206
León,
В.,
A. Klumpp,
M.
Pérez-Amor
and
H.
Sigmund,
Excimer laser
deposition
of silica films: a comparison between
two methods
46 (1990) 210
Licoppe, C, see Nissim
46 (1990) 175
Liu, Y.L., see Krauss
46 (1990) 67
Luches,
Α.,
see
D Anna
46 (1990) 365
Ludescher, H.-P-,
see Eleftheriadis
46 (1990) 284
Luther,
К..,
see
Bolle
46 (1990) 279
Lutz, N..
see Buerhop
46 (1990) 430
Maidom,
G.,
see
Esser
46 (1990) 446
Majni, G.,
see
D Anna
46 (1990) 365
Makhviladze, T.M., see Agafonov
46 (1990) 288
Malba, V.,
see
Bernhardt 46 (1990) 121
Marchet,
P., see Girault
46 (1990) 78
Marfaing, J., see Marine
46 (1990) 239
Marfaing, J., W. Marine,
B. Vídal, M.
Toulemonde,
M.
Hage Ali
and J.P.
Stoquert, Instability and structural
transformation of amorphous ultra-
thin W-Si multilayer structures dur¬
ing heavy ion irradiation
46 (1990) 422
Marine, W-, J.M.
Scotto
D Aniello and J.
Marfaing, Picosecond YAG laser pho-
toablation of amorphous silicon
46 (1990) 239
Marine,
W.,
see Marfaing
46 (1990) 422
Martino,
M.,
see
D Anna
46 (1990) 365
Mayer, S.T., see
Bernhardt 46 (1990) 121
Mele,
Α.,
see Teghil
46(1990)220
Mengucci, P., see
D Arma
46 (1990) 365
Mercurio, J.P.,
see Girault
46 (1990) 78
Metev, S., see
Breuer 46 (1990) 336
Metselaar,
J.
W.,
see
Zeman
46 (1990) 245
Mihailescu, I.N.,
see
D Anna
46 (1990) 365
Moison, J.M.,
see
Nissim
46 (1990) 175
Mollekopf,
G.,
see
Golusda 46 (1990) 230
Morishige,
Y., S. Kitamura and S. Kis-
hida,
High
performance contact for¬
mation in LSI circuit
restructuring
using
visible
pulse
laser
induced
abla¬
tion and CVD
46 (1990) 108
Morone,
Α.,
see
Giardini-Guidoni
46 (1990) 321
Mugnier,
J., see Boelle
46 (1990) 200
Muller, H.G.,
K. Buschick, S.
Schuler
and
Α.
Paredes,
Laser direct writing of
copper on various thin-film substrate
materials
46(1990)143
Muiier,
І.С.,
see Hartiti
46 (1990) 371
Musei,
M.,
see Curcio
46 (1990) 225
Neumayer, G., see Stock
46 (1990) 348
Nissim,
V.J.,
J.M. Moison, F. Houzay, F.
Lebland,
С.
Licoppe and M. Bensous-
san, Photo-assisted deposition of thin
films on III-V semiconductors with
UV and
IR
lamps
46 (1990) 175
Nolhier, N., see Dilhac
46 (1990) 451
Notaro, N.,
see Curcio
46 (1990) 225
Nowak, R.,
see
Konštantínov
46 (1990) 102
Oetzmann,
H.,
see Schmaderer
46 (1990) 53
Oetzmann,
H.,
see Hesch
46 (1990) 233
Paredes,
Α.,
see
Muller
46 (1990) 143
Parrott, M.J.,
see
Pemble
46 (1990) 32
Patel,
P. and
I.W. Boyd,
Low temperature
VUV enhanced growth of thin silicon
dioxide films
46 (1990) 352
Pattyn, H., see Elliq
46 (1990) 378
Pemble, M.E., J.T. Allen,
D.S.
Buhaenko,
S.M. Francis,
P.A.
Goulding, J. Lee
and M.J. Parrott, The adsorption of
triethylgallium on GaAs(lOO) at
300
K: adsorption kinetics from optical
second harmonic generation transients
46 (1990) 32
Pérez-Amor,
M.,
see
Szörényi
46 (1990) 206
Pérez-Amor,
M.,
see
León
46 (1990) 210
Perrin, J.,
see
Petitjean 46 (1990) 189
Persch,
G.,
see
Strecker 46 (1990) 441
Petit, E.J. and R. Caudano, Chemical
re¬
actions at solid-solid interfaces in¬
duced by pulsed laser annealing
46 (1990) 357
Petitjean, M.,
N.
Proust, J.-F. Chapeaub-
lanc and J. Perrin, SiO2 deposition by
direct photolysis at
185
nm of N2O
and SiH4
46 (1990) 189
Petzold, H.-C, see Putzar
46 (1990) 131
Piccirillo, S.,
see Teghil
46 (1990) 220
Piecuch,
M.,
see Dupuis
46 (1990) 398
Pielmeier, R., D. Bollmann and K. Ha-
berger, Laser evaporation of metal
sandwich layers for improved
1С
metallization
46 (1990) 163
Pitaval, M., see Boelle
46 (1990) 200
Polla-Mattiot,
F.,
see Teghil
46 (1990) 220
Pomot, C, see Raynaud
46 (1990) 435
Pou, J.,
see
Szörényi
46 (1990) 206
Prévôt,
В.,
see Elliq
46 (1990) 378
Proust,
N..
see Petitjean
46 (1990) 189
Putzar, R., H.-C. Petzold and H. Staiger,
Optimization of the laser-induced de¬
position technique for its application
in X-ray mask repair
46 (1990) 131
Raddatz, K.-D., see
Hütten 46 (1990) 306
Radhakrishnan, G., W. Stenzel, H. Con¬
rad and A.M. Bradshaw, Photoreac-
tionsof adsorbed CH3Br on Pt(lll)
46(1990) 36
Raley, N.F., see
Bernhardt 46 (1990) 121
Rávet, M.F.,
see Dupuis
46 (1990) 398
Author index
459
Raynaud, P., J.P. Booth and C. Pomot,
Hydrogen plasma treatment of silicon
surfaces studied by in-situ
spectro¬
scopie
ellipsometry
46(1990)435
Rogaila, H., see
Gao
46 (1990) 74
Roger, J.A., see Boelle
46 (1990) 200
Rou, S.H., see Krauss
46 (1990) 67
Saba,
F.,
see Sajjadi
46 (1990) 84
Sajjadi,
Α.,
К.
Kuen-Lau,
F. Saba, F.
Beech and
I.W. Boyd,
Laser-ablation
deposition of uniform thin films of
Ш1Ѕт2СаСа2Ож
46(1990) 84
Sakaue, H., see Horiike
46 (1990) 168
Saivi, A.M., see
Giardini-Guidoni
46 (1990) 321
Schmaderer,
F.,
R.
Huber,
H.
Oetzmann
and
G.
Wahl, High-7; YBa2Cu3O7_5
prepared by chemical vapour deposi¬
tion
46(1990) 53
Schmidt, C, see Hesch
46 (1990) 233
Schoilmeyer, E., see Kesting
46 (1990) 326
Schuier,
S.,
see
Muller
46 (1990) 143
Scotto
D Aniello, J.M., see Marine
46 (1990) 239
Seidl,
Α.,
see
Hu
46 (1990) 388
Sepold,
G.,
see
Breuer 46 (1990) 336
Serna, R.,
see
Afonso
46 (1990) 249
Serna,
R., C.N.
Afonso,
F. Catalina, N.
Teixeira, M.F.
da Silva and S.C.
Soares,
Diffusion and microstruetures
induced by excimer laser irradiation in
Ge-Sb thin film bilayers
46 (1990) 405
Sharma, M.K., see
Hütten 46 (1990) 306
Snen
Yueqiang, see Vase
46 (1990) 61
Siffert, P., see Hartiti
46 (1990) 37]
Sigmund,
H.,
see
León
46 (1990) 210
Simpson,
J.
and J.O. Williams, Prefer¬
ential (111) orientation of ZnSe on
(100)
GaAs deposited by laser-in¬
duced MOCVD
46 (1990) 27
Sinke,
W.C., see Van
Maaren 46(1990)138
Slaoui,
Α.,
see Fogarassy
46 (1990) 195
Slaoui,
Α.,
see Hartiti
46 (1990) 371
Snels, M-, see
Giardini-Guidoni
46 (1990) 321
Soares, J.C.,
see
Serna
46 (1990) 405
Sobie, C.S.,
see Krauss
46 (1990) 67
Solis,
J.,
C.N.
Afonso
and
F. Catalina,
The influence
of the substrate on
ine
transformations induced in Si by
nanosecond laser irradiation: a time-
resolved study
46 (1990) 383
Stafast, H., see
Golusda 46 (1990) 230
Stahmer, K.-W., see
Heidberg 46 (1990) 44
Staiger, H., see Putzar
46 (1990) 131
Stenzel, W., see Radhakrishnan
46 (1990) 36
Stock, G., D. Bolimann, R.
Büchner,
G.
Neumayer
and
К.
Haberger,
Ultra-flat
p-n
junctions formed by solid source
laser doping
46 (1990) 348
Stoquert, J.P., see Fogarassy
46 (1990) 195
Stoquert, J.P., see Elliq
46 (1990) 378
Stoquert, J.P., see Marfaing
46 (1990) 422
Strähnen,
M.,
see
Esser
46 (1990) 446
Strecker,
H. and G. Persch,
Scanning tun¬
neling microscopy and technical appli¬
cations
46 (1990) 441
Stuke, M., see Zhang
46 (1990) 153
Suhren, M., see
Heidberg 46 (1990) 44
Süssbauer,
M.,
see Eleftheriadis
46 (1990) 284
Szörényi,
T.,
P.
Gonzalez,
D.
Fernández,
J.
Pou,
B.
León
and M.
Pérez-Amor,
Gas
mixture dependence of the LCVD
of SiO2 films using an ArF laser
46 (1990) 206
Teghil, R.,
A. Giardini-Guidoni,
S.
Pic¬
cirillo, A. Mele
and F. Polla-Mattiot,
In situ formation of ionic carbide clus¬
ters by laser ablation
46 (1990) 220
Teixeira,
Ν.,
see
Serna
46 (1990) 405
Tête,
С,
see Dupuis
46 (1990) 398
Thomsen-Schmidt, P., see Bostanjoglo
46 (1990) 392
Toulemonde, M., see Marfaing
46 (1990) 422
Troe, J.,
see
Bolle
46 (1990) 279
Tuckerman, D.B., see
Bernhardt 46 (1990) 121
Ulmer,
G., B.
Hasselberger, H.-G. Bus¬
mann
and
E.E.B.
Campbell, Excimer
laser ablation of polyimide
46 (1990) 272
Van den Bergh, H., see Braichotte
46 (1990) 9
Van
der Wel,
W.,
see
Hu
46 (1990) 388
Van
Maaren,
A.J.P., R.L.
Krans
and
W.C.
Sinke, HF
formation in laser-induced
CVD
of tungsten
46 (1990) 138
Van Voorst, J.D.W., see Elders
46 (1990) 215
Vase, P., Shen Yueqiang and T. Freltoft,
Deposition, characterization, and laser
ablation patterning of YBCO thin
films
46(1990) 61
Vidal,
В.,
see Marfaing
46 (1990) 422
Von der Linde, D.,
see
Eleftheriadis
46 (1990) 284
Wahl, G.,
see
Schmaderer
46 (1990) 53
Wahl,
G. and H.
Esrom,
Simulation
of
laser CVD
46(1990) 96
Wautelet, M.,
see
Jadin 46 (1990) 375
Wautelet, M.,
see Kolev
46 (1990) 418
Weissmann,
R.,
see Buerhop
46 (1990) 430
Whitmarsh,
С,
see
Interrante
46 (1990) 5
Williams, J.O.,
see Simpson
46 (1990) 27
Zeman, M., I.
Ferreira, MJ.
Geerts and
J.W.
Metselaar,
The influence of de¬
position parameters on the growth of
a-SiGe:H alloys in a plasma CVD sys¬
tem
46 (1990) 245
460
Author index
Zhang, Y. and M. Stuke, VUV synchro- Zouari, I., M.
Calvo,
F.
Lapicque and M.
tron
radiation processing of thin pal- Cabrera, Morphological improvement
ladium acetate spin-on films for of zinc electrodeposits by laser assis-
metallic surface patterning
46(1990)153
tance
46(1990)411
|
| any_adam_object | 1 |
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| callnumber-sort | TA 3418.7 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | UH 5750 UQ 1100 UQ 2300 |
| classification_tum | FER 800f FER 786f |
| ctrlnum | (OCoLC)22765383 (DE-599)BVBBV005595033 |
| dewey-full | 620/.44 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620/.44 |
| dewey-search | 620/.44 |
| dewey-sort | 3620 244 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Fertigungstechnik |
| format | Conference Proceeding Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1990 Straßburg gnd-content |
| genre_facet | Konferenzschrift 1990 Straßburg |
| id | DE-604.BV005595033 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:32:05Z |
| institution | BVB |
| institution_GND | (DE-588)5026411-4 |
| isbn | 0444889477 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-003504806 |
| oclc_num | 22765383 |
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| owner | DE-91 DE-BY-TUM DE-91G DE-BY-TUM DE-29T DE-11 DE-188 |
| owner_facet | DE-91 DE-BY-TUM DE-91G DE-BY-TUM DE-29T DE-11 DE-188 |
| physical | XV, 476 S. Ill., graph. Darst. |
| publishDate | 1990 |
| publishDateSearch | 1990 |
| publishDateSort | 1990 |
| publisher | North-Holland |
| record_format | marc |
| series | European materials research society symposia proceedings |
| series2 | European materials research society symposia proceedings |
| spelling | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 ed. by I. W. Boyd ... Amsterdam North-Holland 1990 XV, 476 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier European materials research society symposia proceedings 18 Literaturangaben. - Aus: Applied surface science ; 46 Lasers in chemistry Congresses Surfaces (Technology) Congresses Laser (DE-588)4034610-9 gnd rswk-swf Oberflächenbehandlung (DE-588)4042908-8 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1990 Straßburg gnd-content Oberflächenbehandlung (DE-588)4042908-8 s DE-604 Laser (DE-588)4034610-9 s 1\p DE-604 Boyd, Ian W. Sonstige oth Symposium on Surface Processing and Laser Assisted Chemistry 1990 Straßburg Sonstige (DE-588)5026411-4 oth European materials research society symposia proceedings 18 (DE-604)BV004201591 18 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003504806&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 European materials research society symposia proceedings Lasers in chemistry Congresses Surfaces (Technology) Congresses Laser (DE-588)4034610-9 gnd Oberflächenbehandlung (DE-588)4042908-8 gnd |
| subject_GND | (DE-588)4034610-9 (DE-588)4042908-8 (DE-588)1071861417 |
| title | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 |
| title_auth | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 |
| title_exact_search | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 |
| title_full | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 ed. by I. W. Boyd ... |
| title_fullStr | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 ed. by I. W. Boyd ... |
| title_full_unstemmed | Surface processing and laser assisted chemistry proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 ed. by I. W. Boyd ... |
| title_short | Surface processing and laser assisted chemistry |
| title_sort | surface processing and laser assisted chemistry proceedings of symposium e on surface processing and laser assisted chemistry of the 1990 e mrs spring conference strasbourg france 29 may 1 june 1990 |
| title_sub | proceedings of Symposium E on Surface Processing and Laser Assisted Chemistry of the 1990 E-MRS spring conference, Strasbourg, France, 29 May - 1 June 1990 |
| topic | Lasers in chemistry Congresses Surfaces (Technology) Congresses Laser (DE-588)4034610-9 gnd Oberflächenbehandlung (DE-588)4042908-8 gnd |
| topic_facet | Lasers in chemistry Congresses Surfaces (Technology) Congresses Laser Oberflächenbehandlung Konferenzschrift 1990 Straßburg |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003504806&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV004201591 |
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