Innovations in microelectronic processing: March 7 - 9, 1989 Zurich, Switzerland
Gespeichert in:
| Format: | Tagungsbericht Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Mountain View, CA
[circa 1989]
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| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | VIII, 182 S. Ill., graph. Darst. |
Internformat
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Datensatz im Suchindex
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| adam_text | SEMICON EUROPA MARCH 7-9, 1989 ZURICH, SWITZERLAND INNOVATIONS IN
MICROELECTRONIC PROCESSING PRESENTED BY: SEMICONDUCTOR EQUIPMENT AND
MATERIALS INTERNATIONAL IN EUROPE IN UNITED STATES CCL HOUSE 59 FLEET
STREET LONDON EC4Y 1JU TEL: (01) 353-8807 FAX: (01) 583-9171 TLX: 25573
MIDDLEFIELD VIEW 805 EAST MOUNTAIN CA 94043 TEL: (415) 964 5111 FAX:
(415) 967-5375 TLX: 856777 EASYLINK NO: 62819945 ROAD JAPAN TOKYO HILTON
INTERNATIONAL ROOM 2921 6-6-2 NISHI-SHINJUKU SHINJUKU-KU TOKYO 160 TEL:
(03) 345 6061 FAX: (03) 345 6065 EASYLINK NO: 62261920 2000 L STREET NW
SUITE 200 WASHINGTON DC 20036 TEL: (202) 457 9584 FAX: (202) 659 8534
EASYLINK NO: 62031080 TABLE OF CONTENTS TUESDAY, MARCH 7, 1989 - SESSION
I SURFACE PREPARATION CLEANING AND DRYING TECHNOLOGY - (09.30-10.00) D
ROSS 1 SIEMENS AG WEST GERMANY DRY PROCESSING EQUIPMENT AS A SOURCE OF
WAFER CONTAMINATION - (10.00-10.30) U BIEBL 19 GEMETEC WEST GERMANY
ANHYDROUS HF: AN EMERGING TECHNOLOGY - (10.30-11.00) P THOMPSON AND
RICHARD NOVAK 21 FSI INTERNATIONAL USA THE INFLUENCE OF CLEANING ON
SI( 2 GROWTH - (11.00-11.30) H RYSSEL AND W ADERHOLD 31 LEHRSTUHL FUR
ELEKTRONISCHE BAUELEMENT WEST GERMANY AND R WIGET
FRAUNHOFER-ARBEITSGRUPPE FUR INTEGRIERTE SCHALTUNGEN WEST GERMANY SELF
ALIGNED TISI2/TIN BILAYER BY RAPID THERMAL NITRIDATION OF METASTABLE
TITANIUM SILICIDE IN NH3 AMBIENT - (11.30-12.00) A KERMANI 33 PEAK
SYSTEMS USA NEW VAPOR DRYING TECHNOLOGY ADDRESSING CONTAMINATION,
ENVIRONMENTAL AND SAFETY ISSUES - (12.00-12.30) A JONES JR, J HOFFMAN
AND N JONES 45 ATHENS CORP USA BULK AND THIN FILM ANALYSES OF
SEMICONDUCTOR AND RELATED MATERIALS USING GLOW DISCHARGE MASS
SPECTROMETRY -(12.30-1300) D SYKES AND D HALL 57 LOUGHBOROUGH
CONSULTANTS UK VI TABLE OF CONTENTS CONT WEDNESDAY, MARCH 8, 1989 -
SESSION II PAGE NO FILM DEPOSITION LOW TEMPERATURE SELECTIVE EXPITAXY
IN A HOT WALL REACTOR - (09.30-10.00) W OLDHAM, C GATEWSKI AND J LOU 67
UNIVERSITY OF CALIFORNIA USA AN INVESTIGATION INTO THE HYDROGEN REDUCED
SELECTIVE TUNGSTEN PLUG PROCESS FOR CMOS SRAMS - (10.00-10.30) H
NICHOLLS, S MYLONAS AND D CHERNS 79 INMOS UK DEPOSITION ON SILICON
USING DECR EXCITED MICROWAVE ^ MULTIPOLAR PLASMAS (MMP) - (10.30-11.00)
R BURKE, M GUILLERMET, L VALLIER AND E VOISIN 87 CNET FRANCE MEDIUM
TEMPERATURE CONFORMAL SILICON OXIDE DEPOSITION - (11.00-11.30) A
LAGENDIJK, A HOCHBERG AND D O MEARA 95 J C SCHUMACHER USA SINGLE WAFER
PLASMA CVD SYSTEM PROVIDING FUTURE REQUIREMENTS TODAY - (11.30-12.00) A
KIERMASZ 103 ELECTROTECH UK RESIST ETCHBACK PLANARISATION OF AN LTO
INTERLAYER DIELECTRIC FOR A 4 /UM PITCH DLM PROCESS - (12.00-12.30) K
AFFOLTER, S OJHA, P ROSSER AND S JENNINGS 117 STC TECHNOLOGY UK SIO2
ETCHING BY MAGNETIC FIELD ENHANCED RIE - (12.30-13.00) Y OMOTO 127
HITACHI LTD JAPAN TABLE OF CONTENTS CONT THURSDAY, MARCH 9, 1989 -
SESSION III PAGE NO PATTERN DEFINITION MULTIFUNCTIONAL POSITIVE NOVOLAC
RESIST: CHARACTERISED FOR OPTICAL, ELECTRON BEAM AND X-RAY EXPOSURES -
(09.30-10.00) D PETERS, D TOMES AND R GRANT 137 HAMPSHIRE INSTRUMENTS
INC USA AND R WEST OLIN HUNT SPECIALTY PRODUCTS INC USA PATTERNING OF
O,5/UM LINES THROUGH IMAGE REVERSAL - (10.00-10.30) M DUSA AND D
NICOLAU 149 CCSIT-CE ROMANIA CONFOCAL OPTICAL METROLOGY AT 325 NM
WAVELENGTH - (10.30-11.00) I SMITH, S BENNETT AND E PELTZER 159 SISCAN
USA CLEAN SEM METROLOGY IN THE IC PROCESS ENVIRONMENT - (11.00-11.30)
J MULDERS 161 PHILIPS THE NETHERLANDS ADVANCES IN PLANARISATION
TECHNOLOGY - (11.30-12.00) FEDOR COOPMANS 169 IMEC/COBRAIN BELGIUM
PROCESS LEVEL ALIGNMENT OPTIMIZATION USING AN OPTICAL OVERLAY
MEASUREMENT SYSTEM - (12.00-12.30) D COTE AND R BABASICK 171
PERKIN-ELMER USA CLOSING PAPER IC TECHNOLOGY THROUGH THE YEAR 2000 -
(12.30-13.00) B HOLTON 173 SRC USA
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| illustrated | Illustrated |
| indexdate | 2024-07-09T16:29:26Z |
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| language | English |
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| physical | VIII, 182 S. Ill., graph. Darst. |
| publishDate | 1989 |
| publishDateSearch | 1989 |
| publishDateSort | 1989 |
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| spelling | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland Semicon Europa. Presented by: Semiconductor Equipment and Materials International Mountain View, CA [circa 1989] VIII, 182 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Literaturangaben Integrated circuits Congresses Integrated circuits Very large scale integration Congresses Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1989 Zürich gnd-content Halbleitertechnologie (DE-588)4158814-9 s DE-604 Semiconductor Equipment and Materials International (Körperschaft) Sonstige (DE-588)10008311-0 oth Semicon Europa 1989 Zürich Sonstige (DE-588)1400163-9 oth GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003397770&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland Integrated circuits Congresses Integrated circuits Very large scale integration Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)1071861417 |
| title | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland |
| title_auth | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland |
| title_exact_search | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland |
| title_full | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland Semicon Europa. Presented by: Semiconductor Equipment and Materials International |
| title_fullStr | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland Semicon Europa. Presented by: Semiconductor Equipment and Materials International |
| title_full_unstemmed | Innovations in microelectronic processing March 7 - 9, 1989 Zurich, Switzerland Semicon Europa. Presented by: Semiconductor Equipment and Materials International |
| title_short | Innovations in microelectronic processing |
| title_sort | innovations in microelectronic processing march 7 9 1989 zurich switzerland |
| title_sub | March 7 - 9, 1989 Zurich, Switzerland |
| topic | Integrated circuits Congresses Integrated circuits Very large scale integration Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | Integrated circuits Congresses Integrated circuits Very large scale integration Congresses Halbleitertechnologie Konferenzschrift 1989 Zürich |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003397770&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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