Polymers for microelectronics: science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989
Saved in:
| Format: | Conference Proceeding Book |
|---|---|
| Language: | English |
| Published: |
Tokyo
Kodansha u.a.
1990
|
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Item Description: | Literaturangaben |
| Physical Description: | XXI, 848 S. Ill., graph. Darst. |
| ISBN: | 3527281681 0895739879 4062048663 |
Staff View
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV003347454 | ||
| 003 | DE-604 | ||
| 005 | 19921027 | ||
| 007 | t | ||
| 008 | 900702s1990 gw ad|| |||| 10||| eng d | ||
| 020 | |a 3527281681 |9 3-527-28168-1 | ||
| 020 | |a 0895739879 |9 0-89573-987-9 | ||
| 020 | |a 4062048663 |9 4-06-204866-3 | ||
| 035 | |a (OCoLC)21673081 | ||
| 035 | |a (DE-599)BVBBV003347454 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 044 | |a gw |c DE | ||
| 049 | |a DE-91 |a DE-384 |a DE-703 |a DE-92 |a DE-862 |a DE-522 |a DE-634 |a DE-83 |a DE-188 | ||
| 050 | 0 | |a TK7874 | |
| 082 | 0 | |a 621.381 |2 20 | |
| 084 | |a UV 9900 |0 (DE-625)146935: |2 rvk | ||
| 084 | |a ZN 3470 |0 (DE-625)157318: |2 rvk | ||
| 084 | |a ZN 3480 |0 (DE-625)157320: |2 rvk | ||
| 084 | |a ELT 078f |2 stub | ||
| 245 | 1 | 0 | |a Polymers for microelectronics |b science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 |c ed. by Yoneho Tabata ... |
| 264 | 1 | |a Tokyo |b Kodansha u.a. |c 1990 | |
| 300 | |a XXI, 848 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Microélectronique - Matériaux - Congrès | |
| 650 | 4 | |a Polymères - Congrès | |
| 650 | 4 | |a Microelectronics |x Materials |v Congresses | |
| 650 | 4 | |a Polymers |v Congresses | |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Polymere |0 (DE-588)4046699-1 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1989 |z Tokio |2 gnd-content | |
| 689 | 0 | 0 | |a Polymere |0 (DE-588)4046699-1 |D s |
| 689 | 0 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Tabata, Yoneho |d 1928- |e Sonstige |0 (DE-588)118991604 |4 oth | |
| 711 | 2 | |a International Symposium on Polymers for Microelectronics - Science and Technology |d 1989 |c Tokio |j Sonstige |0 (DE-588)2112106-0 |4 oth | |
| 856 | 4 | 2 | |m Digitalisierung TU Muenchen |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=002114609&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-002114609 | ||
Record in the Search Index
| DE-BY-862_location | 2801 |
|---|---|
| DE-BY-FWS_call_number | 1902/2005:0250 |
| DE-BY-FWS_katkey | 73175 |
| DE-BY-FWS_media_number | 083100462985 |
| _version_ | 1824555410828296193 |
| adam_text | Contents
Organizing and Steering Committee V
List of Contributors
VII
Preface
XXIII
Opening Address
XXV
I. Photo- and Radiation Physics and Chemistry
of Polymers, Resist Materials and Processes
for Microelectronics
1
Recent Progress in Organic Resist Materials (C. G. Willson
et al.)
З
2
Non-Uniform Reactivity of Reactions in Polymer Solids
(I. Mita)
19
3
Mechanistic Aspects of Positive Novolak Resists (J.-P. Huang
et al.)
33
4
Radiation Chemistry of Polymers with Simultaneous Scission and Depropagation
(R.W. Garrett
et al.)
47
5
Radiation Chemistry of Resists and Polymer Films Studied by Picosecond and
Nanosecond Pulse Radioiysis (S. Tagawa)
63
6
Mechanism of Radiation-Induced Degradation of PMMA as Studied by ESR and
Electron Spin Echo Methods (H. Yoshida and T. Ichikawa)
83
7
UV and
Х
-Ray Sensitive Polyurethanes Containing Pyrimidine Photodimers
(Y. Inaki
et al.)
91
8
Photo-Initiated Introduction of
Amino
Groups and Image Formation in Thin Polymer
Films (M. Tsunooka and M. Tanaka)
103
9
Studies of Ultraviolet and Electron-Beam Chemistry in
Ketone
Polymers
(S. A. M. Hesp and J. E. Gufflet)
113
10
Radiation Chemistry of Polymers Containing
Heteroatoms
(H. Yamaoka)
131
11
Pulse Radioiysis Study on Formation of PolyiPhenylacetylene) Ions in Solution
(H. Yamaoka
et al.)
143
XVIII
Contents
12
Photosensitive Polymers with Pendant Imino Sulfonate Groups (M. Shirai
et al.)
149
13
Laser Photodecomposition of Polymer Films
:
Changes of Molecular Weight of Poly-
methyl Methacrylates (PMMA) by CO2 Laser Irradiation (T. Ishii
et al.)
157
14
Ultrathin Polymer Films for Electron Beam Nanolithography
(S.W.
J. Kuan
et al.)
169
15
Laser-Responsive Polymers for Microelectronic Applications (C. Decker)
187
16
Polymer Surfaces: Their Role in High Resolution Imaging (G.
N.
Taylor
et al.)
203
17
Surface Imaging for Half-Micron Lithography (B. Roland)
219
18
Wet and Dry Developable Photoresist Systems for Half- and Subhalf-Micron Optical
Lithography (F. Vollenbroek
et al.)
233
19
Patterned Polymerization of
Styrene
by SR-CVD (T. Hayakawa
et al.)
245
20
Recent
Progresse
in Excimer Laser Lithography (M. Nakase
et al.)
255
21
Chemical Modification of PMIPK Resist (K.-D.
Ahn) 269
22
Novel KrF Excimer Laser Resist, SLEX (T.
Ito et al.)
283
23
New Two-Component-Type
Silicone
Resists Based on Alkali-Soluble Silsesquioxane
Oligomer (H. Ban and A. Tanaka)
295
24
A Novel Silicon-Containing Resist for Half-Micron Photolithography
(T. Noguchi
et al.)
305
25
Application of Chrysotfle-Derived Polymer to By-Layer EB Resist
(Y. Yamashita and M. Kazrwara)
317
26
A Highly Sensitive Positive Electron Beam Resist EBR-9 HS31
(M. Kataoka and A. Tokunaga)
327
27
The Mechanism of Reaction in the Development-Free Vapor Photolithography
(X.-Y.
Hong et al.)
343
28
Design Concept for Thermally Resistant Positive Photoresist
(M. Hanabata
et al.)
353
29
Novel Structures of Novolak Resins Designed to Improve Resist Alkaline Dissolution,
Resolution, Thermal Resistance and Ease of Manufacturing
(M. A. Tbokhy
and
B.T. Beauchemia, Jr.)
363
30
l,3-Dio3dn-4-Ones as New Sensitizers for Excimer Laser Lithography
(Y. Onishi
et al.)
375
31
Chemical Amplification in Resist Design: Acid-Catalyzed
Deesterificatíon
(H.
Ito
and
M. Ueda)
383
32
Chemistry and Processes for Deep UV Lithography: Materials for Chemically
Amplified Resists (E. Reichmanis
et al.)
397
Contents XIX
33 Chemical
Amplification
Positive
Resist
Systems
Using Novel Sulfonates as
Acid Generators (T. Ueno
et al.)
413
34
Success in Deep-UV Photoresists (R. Schwalm
et al.)
425
35
Electron Transfer Mechanism for Photocatalyst Generation in Some Chemically-
Amplified Resists (G. S.
Calabrese et al.)
435
36
Highly Sensitive
Х
-Ray and Electron-Beam Resists Using Chemical Amplification
(J.
Lingnau et al.)
445
II. New Photosensitive Polymers and PUB
for Optical Memory and Related Applications
37
Persistent Spectral Hole-Burning: Photon-Gating and Fundamental Statistical Limits
(W. E.
Moener) 465
38
Single Photon Persistent Spectral Holes in Polymers and Glasses with Mesoscopic
Structures (T.
Tani)
481
39
Effect of Polymer Matrices on Thermal Broadening of PHB Holes Above 30K
(T. Nishi
et al.)
497
40
Spectral Hole-Burning and Holographic Image Storage in Polymer Films
(Urs.
P. Wild
et al.)
507
41
Matrix Effect in Photochemical Hole Burning (K. Horie
et al.)
519
42
Photochrornic Liquid Crystal Polymers (V Krongrauz)
529
43
Photochromism of Aromatic Molecules Dispersed in Polymer Solids Through Two
Photon Ionization (A. Tsuchida
et al.)
541
44
Novel Polymers in Data Storage Technology (G. Kaempf
et al.)
549
45
Recording Characteristics of Cyanine Dye/Polymer Systems (N. Matsuzawa
et al.)
567
46
Some Application of Solid Solutions of Spiropyrans in Polymers and in Bilayers for
Information Storage (M. Kryszewski and P. Uznanski)
575
47
Organic Thin Films for Electroluminescence Displays (T. Tsutsui and S. Saito)
591
XX
Contents
III.
Polyimides
and Related Functional Polymers
for Electronics
48
Planarity of High Solid Type Polyimide (Shun-ichiro Uchimura
et al.)
603
49
Planarization of Topographic Substrates by New Polysilphenylenesiloxane Resin for
Fabricating Advanced Microelectronic Devices (A. Oikawa
et al.)
617
50
Stress and Dielectric Characterization of
Thermosets
for Microelectronics
Interconnection and Encapsulation (R.W. Biernath and
D.S.
Soane)
625
51
Studies of the Mechanical Properties and Adhesion of Polyimide Films
(S. D.
Senturia)
637
52
The Relationship Between Visco-Elasticity of Polyimide and Adhesion to Molding
Compound (M. Tomikawa
et al.)
655
53
Adhesion of Aluminum Film to CF4 Plasma Treated Polyimides (Y. Momose
et al.)
665
54
Polyimides for Electronics: Some Recent Developments
(E. L.
Yuan)
677
55
Required Changes in Polyimides for Microelectronics (S. Numata)
689
56
Polyimide of High Purification for Microelectronics (G. Matvelashvili
et al.)
699
57
Electrical Properties of Polyimides for VLSI Interlevel Isolation
(A. Dubey and D. L.
Lüe) 711
58
Molecular Structure and Properties of Aromatic Polyimides (M. I. Bessonov)
721
59
Preparation and Microelectronic Applications of Langmuir-Blodgett Films of
Polyimides and Related Polymers (Y. Imai
et al.)
735
60
Electrical Properties of Polyimide Langmuir-Blodgett Films Deposited on Noble Metal
Electrodes (M. Iwamoto
et al.)
749
61
Negative Resistance and Electron Emission
ш
Metal/Langmuir-BIodgett Film/Metal
Structures (K. Takimoto
et al.)
761
62
Molecularly Oriented Polyimide Ultra-Thin Film Prepared by the Water Surface
Spreading Method (N. Masutani
et al.)
769
63
Miscibffity of Polyimide/Polynnide Blends and Charge-Transfer Fluorescence Spectra
(M. Hasegawa
et al.)
781
64
Photopattemabk Organic Dielectrics: Polybenzoxazoles versus Polyimides
(R. Rubner
et al.)
789
65
Preparation aad Properties of Disilane-Containing Photodegradable Aromatic
Polyamides
and Polyimides from
Bis(4-Amìnophenyl)-Tetramethyldisilane
(M.
Pađmaaabaa
et al.)
811
Contents XXI
66
Preparation and Properties of a Photosensitive Polyimide Having Low Thennal
Expansion and Stress (A. E. Nader
et al.)
823
67
Photocrossiinking Reaction of Benzophenone Type Polyimide and its Derivatives
(T. Yamashita
et al.)
837
Index
845
|
| any_adam_object | 1 |
| author_GND | (DE-588)118991604 |
| building | Verbundindex |
| bvnumber | BV003347454 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UV 9900 ZN 3470 ZN 3480 |
| classification_tum | ELT 078f |
| ctrlnum | (OCoLC)21673081 (DE-599)BVBBV003347454 |
| dewey-full | 621.381 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381 |
| dewey-search | 621.381 |
| dewey-sort | 3621.381 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02260nam a2200517 c 4500</leader><controlfield tag="001">BV003347454</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19921027 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">900702s1990 gw ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3527281681</subfield><subfield code="9">3-527-28168-1</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0895739879</subfield><subfield code="9">0-89573-987-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">4062048663</subfield><subfield code="9">4-06-204866-3</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)21673081</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV003347454</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">gw</subfield><subfield code="c">DE</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-384</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-522</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-188</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UV 9900</subfield><subfield code="0">(DE-625)146935:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 3470</subfield><subfield code="0">(DE-625)157318:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 3480</subfield><subfield code="0">(DE-625)157320:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 078f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Polymers for microelectronics</subfield><subfield code="b">science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989</subfield><subfield code="c">ed. by Yoneho Tabata ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Tokyo</subfield><subfield code="b">Kodansha u.a.</subfield><subfield code="c">1990</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XXI, 848 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microélectronique - Matériaux - Congrès</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymères - Congrès</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield><subfield code="x">Materials</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymers</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Polymere</subfield><subfield code="0">(DE-588)4046699-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1989</subfield><subfield code="z">Tokio</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Polymere</subfield><subfield code="0">(DE-588)4046699-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Tabata, Yoneho</subfield><subfield code="d">1928-</subfield><subfield code="e">Sonstige</subfield><subfield code="0">(DE-588)118991604</subfield><subfield code="4">oth</subfield></datafield><datafield tag="711" ind1="2" ind2=" "><subfield code="a">International Symposium on Polymers for Microelectronics - Science and Technology</subfield><subfield code="d">1989</subfield><subfield code="c">Tokio</subfield><subfield code="j">Sonstige</subfield><subfield code="0">(DE-588)2112106-0</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Digitalisierung TU Muenchen</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=002114609&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-002114609</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1989 Tokio gnd-content |
| genre_facet | Konferenzschrift 1989 Tokio |
| id | DE-604.BV003347454 |
| illustrated | Illustrated |
| indexdate | 2025-02-20T07:07:14Z |
| institution | BVB |
| institution_GND | (DE-588)2112106-0 |
| isbn | 3527281681 0895739879 4062048663 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-002114609 |
| oclc_num | 21673081 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-384 DE-703 DE-92 DE-862 DE-BY-FWS DE-522 DE-634 DE-83 DE-188 |
| owner_facet | DE-91 DE-BY-TUM DE-384 DE-703 DE-92 DE-862 DE-BY-FWS DE-522 DE-634 DE-83 DE-188 |
| physical | XXI, 848 S. Ill., graph. Darst. |
| publishDate | 1990 |
| publishDateSearch | 1990 |
| publishDateSort | 1990 |
| publisher | Kodansha u.a. |
| record_format | marc |
| spellingShingle | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 Microélectronique - Matériaux - Congrès Polymères - Congrès Microelectronics Materials Congresses Polymers Congresses Mikroelektronik (DE-588)4039207-7 gnd Polymere (DE-588)4046699-1 gnd |
| subject_GND | (DE-588)4039207-7 (DE-588)4046699-1 (DE-588)1071861417 |
| title | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 |
| title_auth | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 |
| title_exact_search | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 |
| title_full | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 ed. by Yoneho Tabata ... |
| title_fullStr | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 ed. by Yoneho Tabata ... |
| title_full_unstemmed | Polymers for microelectronics science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 ed. by Yoneho Tabata ... |
| title_short | Polymers for microelectronics |
| title_sort | polymers for microelectronics science and technology proceedings of the international symposium on polymers for microelectronics science and technology pme 89 tokyo japan october 29 to november 2 1989 |
| title_sub | science and technology ; proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89), Tokyo, Japan, October 29 to November 2, 1989 |
| topic | Microélectronique - Matériaux - Congrès Polymères - Congrès Microelectronics Materials Congresses Polymers Congresses Mikroelektronik (DE-588)4039207-7 gnd Polymere (DE-588)4046699-1 gnd |
| topic_facet | Microélectronique - Matériaux - Congrès Polymères - Congrès Microelectronics Materials Congresses Polymers Congresses Mikroelektronik Polymere Konferenzschrift 1989 Tokio |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=002114609&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT tabatayoneho polymersformicroelectronicsscienceandtechnologyproceedingsoftheinternationalsymposiumonpolymersformicroelectronicsscienceandtechnologypme89tokyojapanoctober29tonovember21989 AT internationalsymposiumonpolymersformicroelectronicsscienceandtechnologytokio polymersformicroelectronicsscienceandtechnologyproceedingsoftheinternationalsymposiumonpolymersformicroelectronicsscienceandtechnologypme89tokyojapanoctober29tonovember21989 |
Indexes
THWS Schweinfurt Magazin
| Call Number: |
1902 2005:0250 |
|---|---|
| Copy 1 | bestellbar aus dem Magazin Available Place a Hold |