Semiconductor lithography: principles, practices, and materials
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York [u.a.]
Plenum Press
1988
|
| Series: | Microdevices
|
| Subjects: | |
| Physical Description: | XX, 931 S. Ill., graph. Darst. |
| ISBN: | 0306421852 |
Staff View
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV002213699 | ||
| 003 | DE-604 | ||
| 005 | 19990520 | ||
| 007 | t | ||
| 008 | 890928s1988 ad|| |||| 00||| eng d | ||
| 020 | |a 0306421852 |9 0-306-42185-2 | ||
| 035 | |a (OCoLC)16871199 | ||
| 035 | |a (DE-599)BVBBV002213699 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-29T |a DE-703 |a DE-20 |a DE-706 |a DE-11 | ||
| 050 | 0 | |a TK7871.85 | |
| 082 | 0 | |a 621.3815/2 |2 19 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 084 | |a ELT 340f |2 stub | ||
| 084 | |a ELT 285f |2 stub | ||
| 100 | 1 | |a Moreau, Wayne M. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Semiconductor lithography |b principles, practices, and materials |c Wayne M. Moreau |
| 264 | 1 | |a New York [u.a.] |b Plenum Press |c 1988 | |
| 300 | |a XX, 931 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Microdevices | |
| 650 | 7 | |a Microlithographie |2 ram | |
| 650 | 7 | |a Semiconducteurs |2 ram | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Photoresists | |
| 650 | 4 | |a Semiconductors | |
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 1 | |8 1\p |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001453951 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Record in the Search Index
| _version_ | 1804116668057649152 |
|---|---|
| any_adam_object | |
| author | Moreau, Wayne M. |
| author_facet | Moreau, Wayne M. |
| author_role | aut |
| author_sort | Moreau, Wayne M. |
| author_variant | w m m wm wmm |
| building | Verbundindex |
| bvnumber | BV002213699 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4170 |
| classification_tum | ELT 340f ELT 285f |
| ctrlnum | (OCoLC)16871199 (DE-599)BVBBV002213699 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01740nam a2200493 c 4500</leader><controlfield tag="001">BV002213699</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19990520 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1988 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0306421852</subfield><subfield code="9">0-306-42185-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)16871199</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002213699</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-706</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7871.85</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">19</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 340f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Moreau, Wayne M.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Semiconductor lithography</subfield><subfield code="b">principles, practices, and materials</subfield><subfield code="c">Wayne M. Moreau</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York [u.a.]</subfield><subfield code="b">Plenum Press</subfield><subfield code="c">1988</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XX, 931 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Microdevices</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Microlithographie</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconducteurs</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photoresists</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001453951</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| id | DE-604.BV002213699 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:42:10Z |
| institution | BVB |
| isbn | 0306421852 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001453951 |
| oclc_num | 16871199 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-29T DE-703 DE-20 DE-706 DE-11 |
| owner_facet | DE-91 DE-BY-TUM DE-29T DE-703 DE-20 DE-706 DE-11 |
| physical | XX, 931 S. Ill., graph. Darst. |
| publishDate | 1988 |
| publishDateSearch | 1988 |
| publishDateSort | 1988 |
| publisher | Plenum Press |
| record_format | marc |
| series2 | Microdevices |
| spelling | Moreau, Wayne M. Verfasser aut Semiconductor lithography principles, practices, and materials Wayne M. Moreau New York [u.a.] Plenum Press 1988 XX, 931 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microdevices Microlithographie ram Semiconducteurs ram Microlithography Photoresists Semiconductors Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Integrierte Schaltung (DE-588)4027242-4 s DE-604 Lithografie Halbleitertechnologie (DE-588)4191584-7 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Moreau, Wayne M. Semiconductor lithography principles, practices, and materials Microlithographie ram Semiconducteurs ram Microlithography Photoresists Semiconductors Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4174516-4 (DE-588)4191584-7 |
| title | Semiconductor lithography principles, practices, and materials |
| title_auth | Semiconductor lithography principles, practices, and materials |
| title_exact_search | Semiconductor lithography principles, practices, and materials |
| title_full | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_fullStr | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_full_unstemmed | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_short | Semiconductor lithography |
| title_sort | semiconductor lithography principles practices and materials |
| title_sub | principles, practices, and materials |
| topic | Microlithographie ram Semiconducteurs ram Microlithography Photoresists Semiconductors Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Microlithographie Semiconducteurs Microlithography Photoresists Semiconductors Integrierte Schaltung Fotolithografie Halbleitertechnologie Lithografie Halbleitertechnologie |
| work_keys_str_mv | AT moreauwaynem semiconductorlithographyprinciplespracticesandmaterials |