Ion implantation and beam processing:
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Sydney u.a.
Acad. Pr.
1984
|
| Subjects: | |
| Item Description: | Literaturangaben |
| Physical Description: | XI, 419 S. Ill., graph. Darst. |
| ISBN: | 0127569804 |
Staff View
MARC
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| 245 | 1 | 0 | |a Ion implantation and beam processing |c ed. by J. S. Williams ... |
| 264 | 1 | |a Sydney u.a. |b Acad. Pr. |c 1984 | |
| 300 | |a XI, 419 S. |b Ill., graph. Darst. | ||
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| 650 | 4 | |a Semiconducteurs - Dopage | |
| 650 | 4 | |a Electron beams | |
| 650 | 4 | |a Ion bombardment | |
| 650 | 4 | |a Ion implantation | |
| 650 | 4 | |a Semiconductor doping | |
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| 700 | 1 | |a Williams, James S. |e Sonstige |4 oth | |
| 940 | 1 | |q TUB-nseb | |
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Record in the Search Index
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| callnumber-first | Q - Science |
| callnumber-label | QC702 |
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| callnumber-search | QC702.7.I55 |
| callnumber-sort | QC 3702.7 I55 |
| callnumber-subject | QC - Physics |
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| classification_tum | ELT 293f |
| ctrlnum | (OCoLC)10958087 (DE-599)BVBBV002110844 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
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| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV002110844 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:40:31Z |
| institution | BVB |
| isbn | 0127569804 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001384358 |
| oclc_num | 10958087 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-384 DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-384 DE-83 |
| physical | XI, 419 S. Ill., graph. Darst. |
| psigel | TUB-nseb |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | Acad. Pr. |
| record_format | marc |
| spelling | Ion implantation and beam processing ed. by J. S. Williams ... Sydney u.a. Acad. Pr. 1984 XI, 419 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Literaturangaben Bombardement ionique Faisceaux électroniques Ions - Implantation Semiconducteurs - Dopage Electron beams Ion bombardment Ion implantation Semiconductor doping Halbleiter (DE-588)4022993-2 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 gnd rswk-swf Halbleiter (DE-588)4022993-2 s Ionenimplantation (DE-588)4027606-5 s 1\p DE-604 Williams, James S. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Ion implantation and beam processing Bombardement ionique Faisceaux électroniques Ions - Implantation Semiconducteurs - Dopage Electron beams Ion bombardment Ion implantation Semiconductor doping Halbleiter (DE-588)4022993-2 gnd Ionenimplantation (DE-588)4027606-5 gnd |
| subject_GND | (DE-588)4022993-2 (DE-588)4027606-5 |
| title | Ion implantation and beam processing |
| title_auth | Ion implantation and beam processing |
| title_exact_search | Ion implantation and beam processing |
| title_full | Ion implantation and beam processing ed. by J. S. Williams ... |
| title_fullStr | Ion implantation and beam processing ed. by J. S. Williams ... |
| title_full_unstemmed | Ion implantation and beam processing ed. by J. S. Williams ... |
| title_short | Ion implantation and beam processing |
| title_sort | ion implantation and beam processing |
| topic | Bombardement ionique Faisceaux électroniques Ions - Implantation Semiconducteurs - Dopage Electron beams Ion bombardment Ion implantation Semiconductor doping Halbleiter (DE-588)4022993-2 gnd Ionenimplantation (DE-588)4027606-5 gnd |
| topic_facet | Bombardement ionique Faisceaux électroniques Ions - Implantation Semiconducteurs - Dopage Electron beams Ion bombardment Ion implantation Semiconductor doping Halbleiter Ionenimplantation |
| work_keys_str_mv | AT williamsjamess ionimplantationandbeamprocessing |