Chemical vapor deposition for microelectronics: principles, technology, and applications
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Park Ridge, NJ
Noyes Publ.
1987
|
| Series: | Materials science and process technology series.
|
| Subjects: | |
| Item Description: | Literaturangaben |
| Physical Description: | XI, 215 S. Ill., graph. Darst. |
| ISBN: | 0815511361 |
Staff View
MARC
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Record in the Search Index
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| callnumber-first | T - Technology |
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| ctrlnum | (OCoLC)15657978 (DE-599)BVBBV002067041 |
| dewey-full | 621.381/7 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/7 |
| dewey-search | 621.381/7 |
| dewey-sort | 3621.381 17 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Fertigungstechnik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| format | Book |
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| id | DE-604.BV002067041 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:39:46Z |
| institution | BVB |
| isbn | 0815511361 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001351848 |
| oclc_num | 15657978 |
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| owner_facet | DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-M347 DE-29T DE-384 DE-83 DE-11 DE-188 |
| physical | XI, 215 S. Ill., graph. Darst. |
| publishDate | 1987 |
| publishDateSearch | 1987 |
| publishDateSort | 1987 |
| publisher | Noyes Publ. |
| record_format | marc |
| series2 | Materials science and process technology series. |
| spelling | Sherman, Arthur Verfasser aut Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman Park Ridge, NJ Noyes Publ. 1987 XI, 215 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series. Literaturangaben Integrated circuits Design and construction Vapor-plating Mikroelektronik (DE-588)4039207-7 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Aufdampfen (DE-588)4143379-8 gnd rswk-swf Elektronische Schaltung (DE-588)4113419-9 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s Mikroelektronik (DE-588)4039207-7 s DE-604 Aufdampfen (DE-588)4143379-8 s Elektronische Schaltung (DE-588)4113419-9 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Sherman, Arthur Chemical vapor deposition for microelectronics principles, technology, and applications Integrated circuits Design and construction Vapor-plating Mikroelektronik (DE-588)4039207-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd Aufdampfen (DE-588)4143379-8 gnd Elektronische Schaltung (DE-588)4113419-9 gnd |
| subject_GND | (DE-588)4039207-7 (DE-588)4009846-1 (DE-588)4143379-8 (DE-588)4113419-9 |
| title | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_auth | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_exact_search | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_full | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_fullStr | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_full_unstemmed | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_short | Chemical vapor deposition for microelectronics |
| title_sort | chemical vapor deposition for microelectronics principles technology and applications |
| title_sub | principles, technology, and applications |
| topic | Integrated circuits Design and construction Vapor-plating Mikroelektronik (DE-588)4039207-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd Aufdampfen (DE-588)4143379-8 gnd Elektronische Schaltung (DE-588)4113419-9 gnd |
| topic_facet | Integrated circuits Design and construction Vapor-plating Mikroelektronik CVD-Verfahren Aufdampfen Elektronische Schaltung |
| work_keys_str_mv | AT shermanarthur chemicalvapordepositionformicroelectronicsprinciplestechnologyandapplications |