Holdings: Photoresist :: THWS Bibkatalog

Photoresist: Materials and processes

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Bibliographic Details
Main Author:	De Forest, William S. (Author)
Format:	Book
Language:	English
Published:	New York McGraw-Hill 1975
Subjects:	Integrated circuits Photoresists Printed circuits Photowiderstand Organische Verbindungen Elektronik Makromolekül Photoresist Polymere
Physical Description:	XI, 269 S. Ill. u. graph. Darst.

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MARC


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Record in the Search Index

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dewey-tens	620 - Engineering and allied operations
discipline	Physik Elektrotechnik / Elektronik / Nachrichtentechnik
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illustrated	Illustrated
indexdate	2024-07-09T15:38:05Z
institution	BVB
language	English
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physical	XI, 269 S. Ill. u. graph. Darst.
publishDate	1975
publishDateSearch	1975
publishDateSort	1975
publisher	McGraw-Hill
record_format	marc
spelling	De Forest, William S. Verfasser aut Photoresist Materials and processes New York McGraw-Hill 1975 XI, 269 S. Ill. u. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Integrated circuits Photoresists Printed circuits Photowiderstand (DE-588)4136944-0 gnd rswk-swf Organische Verbindungen (DE-588)4043816-8 gnd rswk-swf Elektronik (DE-588)4014346-6 gnd rswk-swf Makromolekül (DE-588)4037172-4 gnd rswk-swf Photoresist (DE-588)4174545-0 gnd rswk-swf Polymere (DE-588)4046699-1 gnd rswk-swf Photowiderstand (DE-588)4136944-0 s DE-604 Photoresist (DE-588)4174545-0 s Makromolekül (DE-588)4037172-4 s 1\p DE-604 Organische Verbindungen (DE-588)4043816-8 s 2\p DE-604 Polymere (DE-588)4046699-1 s 3\p DE-604 Elektronik (DE-588)4014346-6 s 4\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	De Forest, William S. Photoresist Materials and processes Integrated circuits Photoresists Printed circuits Photowiderstand (DE-588)4136944-0 gnd Organische Verbindungen (DE-588)4043816-8 gnd Elektronik (DE-588)4014346-6 gnd Makromolekül (DE-588)4037172-4 gnd Photoresist (DE-588)4174545-0 gnd Polymere (DE-588)4046699-1 gnd
subject_GND	(DE-588)4136944-0 (DE-588)4043816-8 (DE-588)4014346-6 (DE-588)4037172-4 (DE-588)4174545-0 (DE-588)4046699-1
title	Photoresist Materials and processes
title_auth	Photoresist Materials and processes
title_exact_search	Photoresist Materials and processes
title_full	Photoresist Materials and processes
title_fullStr	Photoresist Materials and processes
title_full_unstemmed	Photoresist Materials and processes
title_short	Photoresist
title_sort	photoresist materials and processes
title_sub	Materials and processes
topic	Integrated circuits Photoresists Printed circuits Photowiderstand (DE-588)4136944-0 gnd Organische Verbindungen (DE-588)4043816-8 gnd Elektronik (DE-588)4014346-6 gnd Makromolekül (DE-588)4037172-4 gnd Photoresist (DE-588)4174545-0 gnd Polymere (DE-588)4046699-1 gnd
topic_facet	Integrated circuits Photoresists Printed circuits Photowiderstand Organische Verbindungen Elektronik Makromolekül Photoresist Polymere
work_keys_str_mv	AT deforestwilliams photoresistmaterialsandprocesses

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