Introduction to microlithography: theory, materials, and processing
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Washington, DC
1983
|
| Schriftenreihe: | American Chemical Society: ACS symposium series
219 |
| Schlagworte: | |
| Beschreibung: | IX, 363 S. Ill. |
| ISBN: | 0841207755 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV000117847 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 870612s1983 a||| |||| 00||| eng d | ||
| 020 | |a 0841207755 |9 0-8412-0775-5 | ||
| 035 | |a (OCoLC)421845956 | ||
| 035 | |a (DE-599)BVBBV000117847 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-12 |a DE-29T |a DE-83 |a DE-11 |a DE-355 | ||
| 050 | 0 | |a QD3A37V.219 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 245 | 1 | 0 | |a Introduction to microlithography |b theory, materials, and processing |c L. F. Thompson ..., ed. |
| 264 | 1 | |a Washington, DC |c 1983 | |
| 300 | |a IX, 363 S. |b Ill. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a American Chemical Society: ACS symposium series |v 219 | |
| 650 | 4 | |a Chimie | |
| 650 | 4 | |a Photolithographie | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4151278-9 |a Einführung |2 gnd-content | |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1983 |z Seattle Wash. |2 gnd-content | |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Thompson, Larry F. |e Sonstige |4 oth | |
| 830 | 0 | |a American Chemical Society: ACS symposium series |v 219 |w (DE-604)BV000003091 |9 219 | |
| 940 | 1 | |q TUB-nseb | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-000063043 | ||
Datensatz im Suchindex
| _version_ | 1804114575758458880 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV000117847 |
| callnumber-first | Q - Science |
| callnumber-label | QD3A37V |
| callnumber-raw | QD3A37V.219 |
| callnumber-search | QD3A37V.219 |
| callnumber-sort | QD 13 A37 V 3219 |
| callnumber-subject | QD - Chemistry |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)421845956 (DE-599)BVBBV000117847 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01416nam a2200397 cb4500</leader><controlfield tag="001">BV000117847</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">870612s1983 a||| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0841207755</subfield><subfield code="9">0-8412-0775-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)421845956</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV000117847</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-12</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield><subfield code="a">DE-355</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">QD3A37V.219</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Introduction to microlithography</subfield><subfield code="b">theory, materials, and processing</subfield><subfield code="c">L. F. Thompson ..., ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, DC</subfield><subfield code="c">1983</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 363 S.</subfield><subfield code="b">Ill.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">American Chemical Society: ACS symposium series</subfield><subfield code="v">219</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chimie</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithographie</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4151278-9</subfield><subfield code="a">Einführung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1983</subfield><subfield code="z">Seattle Wash.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Thompson, Larry F.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">American Chemical Society: ACS symposium series</subfield><subfield code="v">219</subfield><subfield code="w">(DE-604)BV000003091</subfield><subfield code="9">219</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">TUB-nseb</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-000063043</subfield></datafield></record></collection> |
| genre | (DE-588)4151278-9 Einführung gnd-content (DE-588)1071861417 Konferenzschrift 1983 Seattle Wash. gnd-content |
| genre_facet | Einführung Konferenzschrift 1983 Seattle Wash. |
| id | DE-604.BV000117847 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:08:54Z |
| institution | BVB |
| isbn | 0841207755 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-000063043 |
| oclc_num | 421845956 |
| open_access_boolean | |
| owner | DE-12 DE-29T DE-83 DE-11 DE-355 DE-BY-UBR |
| owner_facet | DE-12 DE-29T DE-83 DE-11 DE-355 DE-BY-UBR |
| physical | IX, 363 S. Ill. |
| psigel | TUB-nseb |
| publishDate | 1983 |
| publishDateSearch | 1983 |
| publishDateSort | 1983 |
| record_format | marc |
| series | American Chemical Society: ACS symposium series |
| series2 | American Chemical Society: ACS symposium series |
| spelling | Introduction to microlithography theory, materials, and processing L. F. Thompson ..., ed. Washington, DC 1983 IX, 363 S. Ill. txt rdacontent n rdamedia nc rdacarrier American Chemical Society: ACS symposium series 219 Chimie Photolithographie Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)4151278-9 Einführung gnd-content (DE-588)1071861417 Konferenzschrift 1983 Seattle Wash. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Thompson, Larry F. Sonstige oth American Chemical Society: ACS symposium series 219 (DE-604)BV000003091 219 |
| spellingShingle | Introduction to microlithography theory, materials, and processing American Chemical Society: ACS symposium series Chimie Photolithographie Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4151278-9 (DE-588)1071861417 |
| title | Introduction to microlithography theory, materials, and processing |
| title_auth | Introduction to microlithography theory, materials, and processing |
| title_exact_search | Introduction to microlithography theory, materials, and processing |
| title_full | Introduction to microlithography theory, materials, and processing L. F. Thompson ..., ed. |
| title_fullStr | Introduction to microlithography theory, materials, and processing L. F. Thompson ..., ed. |
| title_full_unstemmed | Introduction to microlithography theory, materials, and processing L. F. Thompson ..., ed. |
| title_short | Introduction to microlithography |
| title_sort | introduction to microlithography theory materials and processing |
| title_sub | theory, materials, and processing |
| topic | Chimie Photolithographie Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Chimie Photolithographie Fotolithografie Halbleitertechnologie Einführung Konferenzschrift 1983 Seattle Wash. |
| volume_link | (DE-604)BV000003091 |
| work_keys_str_mv | AT thompsonlarryf introductiontomicrolithographytheorymaterialsandprocessing |