Ion sources:
Gespeichert in:
1. Verfasser: | |
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Format: | Buch |
Sprache: | English |
Veröffentlicht: |
Beijing [u.a.]
Science Press [u.a.]
1999
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Schlagworte: | |
Online-Zugang: | Inhaltsverzeichnis |
Beschreibung: | XVIII, 476 S. Ill., graph. Darst. |
ISBN: | 3540657479 7030073517 |
Internformat
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Datensatz im Suchindex
_version_ | 1804127392866762752 |
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adam_text | V PREFACE ION SOURCE IS A RAPIDLY EVOLVING APPLIED SCIENCE AND
TECHNOLOGY WITH WIDE APPLICATIONS. ITS DEVELOPMENT RELIES ON MANY
SCIENTI*C *ELDS AND INDUSTRIAL TECHNOLOGIES. ION SOURCES ARE IMPORTANT
IN MANY FUNDAMENTAL SCIENCES, SUCH AS ATOMIC PHYSICS, PLASMA PHYSICS,
PLASMA CHEMISTRY, NUCLEAR PHYSICS. THEIR PIONEER- ING DEVELOPMENTS AND
APPLICATIONS INCLUDE THE SCIENTI*C AND TECHNOLOGICAL FRONTIERS OF MASS
SPECTROSCOPY, ACCELERATORS, ISOTOPE SEPARATION, ION PROPUL- SION,
CONTROLLED THERMONUCLEAR FUSION AND RADIATION THERAPY ETC. THEY ARE ALSO
IMPORTANT TO MANY INDUSTRIAL PROCESSES OF ION IMPLANTATION, ION ETCHING,
MICROANALYSIS, MICROFABRICATION AND OTHERS. THE DEVELOPMENT OF ION
SOURCES DEPENDS NOT ONLY ON VARIOUS SCIENTI*C KNOWLEDGE, INCLUDING GAS
DISCHARGE, ATOMIC PHYSICS, PLASMA PHYSICS, SURFACE PHYSICS, INTENSE ION
OPTICS AND COMPUTATIONAL MATHEMATICS, BUT ALSO ON MANY NEWLY DEVELOPING
TECHNOLOGIES, WHICH INCLUDE PLASMA AND BEAM DIAGNOSTICS, SOPHISTICATED
HIGH VOLTAGE EQUIPMENT, MODERN VACUUM SYSTEMS, INTENSE AND QUALITY
MAGNETIC *ELDS, HIGH-INTENSITY ELECTRON GUNS, MICROCOMPUTERS AND SPECIAL
MATERIALS. ACCORDING TO LIMITED STATISTICS, THE NUMBER OF PRINCIPAL
TYPES OF SOURCES EXCEEDS ONE HUNDRED. THEIR DEVELOPMENTS ARE DRIVEN BY
MANY AREAS OF AP- PLICATIONS WHICH PROPOSE NEW DI*ERENT REQUIREMENTS AND
ANTICIPATE FURTHER DEVELOPMENTS. ION SOURCE IS AN OLD SCIENCE, BUT STILL
A RAPIDLY DEVELOPING SCIENCE. AL- THOUGH IT HAS BEEN STUDIED FOR MORE
THAN EIGHTY YEARS, IT IS STILL A SEMI- EMPIRICAL SCIENCE AND
TECHNIQUE. NUMEROUS PAPERS|APPROXIMATELY 400 PA- PERS PER YEAR DURING
THE PAST DECADE|HAVE BEEN PRESENTED IN A WIDE VARIETY OF JOURNALS AND
CONFERENCE PROCEEDINGS. AS A RESULT OF THE EMERGENCE OF NEW APPLICATIONS
FOR ION SOURCES, MORE SCIENTISTS AND ENGINEERS HAVE THE NEED TO
SYSTEMATICALLY STUDY AND USE ION SOURCES. THIS BOOK IS INTENDED TO SERVE
A THREEFOLD PURPOSE, IN A MANNER IT IS USEFUL TO THOSE WHO ARE NEW TO
THIS *ELD AS WELL AS TO THE EXPERTS. FIRST, TO PROVIDE COMPREHENSIVE
INFORMATION THAT IS EASILY UNDERSTOOD AND PROVIDE FUNDAMENTAL AND
TECHNICAL KNOWLEDGE ASSOCIATED WITH ION SOURCES IN SU*CIENT DEPTH TO BE
USEFUL TO THE NEW OR LABORATORY WORKERS. SECOND, TO BRIEFLY REVIEW THE
ESSENTIAL PRINCIPLES AND MAJOR RESEARCH ACHIEVEMENTS TO DATE OF VARIOUS
SOURCES GIVING AVAILABLE RECENT INFORMATION ON THE DESIGN AND OPERATION
OF THE SOURCE. THIRD, TO PRESENT A GREAT QUANTITY OF COMMONLY USED
SOURCE VI DIAGRAMS, DRAWINGS, CURVES, PHYSICAL CONSTANTS, USEFUL
FORMULAS, REFERENCES, ETC., THUS MAKING THE BOOK A USEFUL PRACTICAL
REFERENCE. FUNDAMENTAL KNOWLEDGE REGARDING SOURCE PERFORMANCE, GAS
DISCHARGE, EX- TRACTION SYSTEM AND SPACE-CHARGE NEUTRALIZATION IS
PRESENTED IN CHAPTERS 1, 2, 3 AND 9. POSITIVE ION SOURCES ARE INTRODUCED
IN CHAPTER 4. THE PRINCIPLES FOR PRODUCING NEGATIVE AND MULTI-CHARGED
IONS ARE DISCUSSED IN CHAPTERS 6 AND 8. THE PROCESSES DETERMINING THE
MASS AND ENERGY SPECTRA OF SOURCES ARE DISCUSSED IN CHAPTER 7. THE GIANT
ION SOURCES, MULTI-CHARGED SOURCES AND NEGATIVE SOURCES, WHICH HAVE
DEVELOPED FASTEST DURING THE PAST THIRTY YEARS, ARE DISCUSSED IN DETAIL
IN CHAPTERS 5, 6 AND 8. FINALLY, BEAM DIAGNOSTIC IS IN- TRODUCED IN
CHAPTER 10. MANY USEFUL PHYSICAL CONSTANTS AND DATA ARE GIVEN IN THE
APPENDIX. THIS BOOK HAS EXTRACTED ITS CONTENTS FROM MORE THAN 4000
ARTICLES PUBLISHED IN DI*ERENT JOURNALS AND OTHER PUBLICATIONS, TO AVOID
TOO MUCH CONSUMPTION OF SPACE ONLY ABOUT ONE THOUSAND FOREMOST
REFERENCES, WHICH ARE SU*CIENT TO GUIDE THE READERS TO FURTHER
INFORMATION ON TOPICS OF PARTICULAR INTEREST, ARE GIVEN. THE ORIGINAL
MANUSCRIPT OF THIS BOOK WAS WRITTEN BY ZHANG HUASHUN BASED ON HIS BOOK,
IN CHINESE, ION SOURCES AND POWERFUL NEUTRAL BEAM INJECTORS . PARTS OF
CHAPTERS 2, 4 AND 9 OF THE CHINESE BOOK WERE WRITTEN BY WAN CHUNHOU,
LIKEWISE PARTS OF CHAPTER 5 WERE WRITTEN BY WANG GENGJIE. THE AUTHOR
THANKS DR. P. ALLISON AND K. PRELEC FOR THEIR ENCOURAGEMENT FOR THIS
ENGLISH VERSION. THE ENGLISH MANUSCRIPT WAS EXTENSIVELY REVIEWED AND
REEDITED BY MR. C. W. SCHMIDT, WHO MADE A GREAT CONTRIBUTION TO THE BOOK
QUALITY. THANKS ARE DUE TO MANY PUBLISHERS, ORGANIZATIONS AND PERSONS
FOR PER- MISSION TO REPRODUCE MATERIALS AND *GURES FROM VARIOUS BOOKS
AND JOURNALS. XI CONTENTS 1 INTRODUCTION 1 1.1 MAJOR APPLICATIONS AND
REQUIREMENTS . . . . . . . . . . . . . . . 1 1.2 PERFORMANCES AND
RESEARCH SUBJECTS . . . . . . . . . . . . . . . . 1 1.3 HISTORICAL
DEVELOPMENT . . . . . . . . . . . . . . . . . . . . . . . . . 8 2 GAS
DISCHARGE FUNDAMENTALS 11 2.1 THERMIONIC EMISSION . . . . . . . . . . .
. . . . . . . . . . . . . . . . 11 2.2 SECONDARY ELECTRON EMISSION . . .
. . . . . . . . . . . . . . . . . . 12 2.3 SURFACE IONIZATION . . . . .
. . . . . . . . . . . . . . . . . . . . . . . . 13 2.4 ELASTIC AND
INELASTIC COLLISIONS . . . . . . . . . . . . . . . . . . . . 16 2.4.1
COLLISION AND PROBABILITY OF COLLISION . . . . . . . . . . . 16 2.4.2
ELASTIC COLLISION AND ITS CROSS SECTION . . . . . . . . . . 18 2.4.3
INELASTIC COLLISION . . . . . . . . . . . . . . . . . . . . . . . . 20
2.5 IONIZATION CROSS SECTION . . . . . . . . . . . . . . . . . . . . . .
. . . 21 2.6 RECOMBINATION OF CHARGED PARTICLES . . . . . . . . . . . .
. . . . . 22 2.7 MOBILITY . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . . . 23 2.8 DI*USION COE*CIENT . . . . . . . . . . .
. . . . . . . . . . . . . . . . 25 2.9 PARTICLE DISTRIBUTION IN A
RETARDATION REGION . . . . . . . . . . 26 2.10 AMBIPOLAR DI*USION . . .
. . . . . . . . . . . . . . . . . . . . . . . . 26 2.11 MAGNETIC FIELD
INFLUENCE ON PARTICLE MOTION . . . . . . . . . . . 28 2.12 FUNDAMENTALS
OF A HOT-CATHODE ARC SOURCE . . . . . . . . . . . 29 2.12.1 STABLE
THEORY OF THE CATHODE DOUBLE SHEATH . . . . . . 29 1. BIPOLAR FLOW . . .
. . . . . . . . . . . . . . . . . . . . . . 30 2. CATHODE DOUBLE SHEATH
. . . . . . . . . . . . . . . . . . 31 2.12.2 CATHODE DOUBLE SHEATH
OSCILLATIONS AND NOISE . . . . . 34 2.12.3 SCATTERING OF PRIMARY
ELECTRONS . . . . . . . . . . . . . . . 35 2.12.4 BEAM-PLASMA
INTERACTION . . . . . . . . . . . . . . . . . . . 36 2.12.5 POSITIVE
COLUMN PLASMA . . . . . . . . . . . . . . . . . . . . 38 2.12.6 ANODE
REGION . . . . . . . . . . . . . . . . . . . . . . . . . . . 44 2.12.7
MINIMUM PRESSURE . . . . . . . . . . . . . . . . . . . . . . . 45
REFERENCES . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . 46 3 EXTRACTION SYSTEMS FOR ION SOURCES 47 3.1 EXTRACTION
SYSTEMS REQUIREMENTS . . . . . . . . . . . . . . . . . . 47 3.2
EXTRACTION SYSTEM WITH A SOLID EMITTER . . . . . . . . . . . . . . 48
3.2.1 SPACE-CHARGE-LIMITED FLOW FOR AN IDEAL DIODE . . . . . 48 1. PLANE
DIODE . . . . . . . . . . . . . . . . . . . . . . . . . . 48 2.
CYLINDRICAL DIODE . . . . . . . . . . . . . . . . . . . . . . 51 XII 3.
SPHERICAL DIODE . . . . . . . . . . . . . . . . . . . . . . . 51 4. SOME
UNIVERSAL RELATIONSHIPS . . . . . . . . . . . . . . 52 3.2.2
SPACE-CHARGE-LIMITED FLOW WITH MULTIPLE ION SPECIES 54 3.2.3
PIERCE-SHAPE EXTRACTION SYSTEM . . . . . . . . . . . . . . 56 3.2.4
HIGH-PERVEANCE ELECTRON GUN . . . . . . . . . . . . . . . . 57 3.3
EMITTANCE AND BRIGHTNESS . . . . . . . . . . . . . . . . . . . . . . .
58 3.3.1 EMITTANCE . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . 58 3.3.2 BRIGHTNESS . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . 60 3.3.3 RELATION BETWEEN BRIGHTNESS AND EMITTANCE . . . . . .
61 3.3.4 E*ECTIVE EMITTANCE . . . . . . . . . . . . . . . . . . . . . .
. 62 3.3.5 EMITTANCE AND BRIGHTNESS OF AN ION SOURCE . . . . . . . 63
3.4 ION EXTRACTION FROM A PLASMA . . . . . . . . . . . . . . . . . . . .
. 65 3.4.1 PLASMA-SHEATH EQUATION AND THE EMITTING CURRENT FROM A PLASMA
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 65 3.4.2 THE
EXTRACTABLE FLOW FROM AN EXTRACTION SYSTEM . 70 3.4.3 ADJUSTMENT OF
ION EMISSIVE SURFACE . . . . . . . . . . . . 71 3.4.4 COMPARISON BETWEEN
A PLASMA ION SOURCE AND AN ELECTRON GUN EXTRACTION SYSTEM . . . . . . .
. . . . . . . 72 3.5 GEOMETRY OF EXTRACTION SYSTEMS . . . . . . . . . .
. . . . . . . . . 73 3.5.1 TYPICAL TYPES AND GEOMETRIES . . . . . . . .
. . . . . . . . 73 3.5.2 PROBE EXTRACTION SYSTEMS FOR LOW PLASMA DENSITY
. . 76 1. PRINCIPLE AND ANALYTICAL MODEL . . . . . . . . . . . . . 76 2.
EXPERIMENTAL RESULTS . . . . . . . . . . . . . . . . . . . . 79 3.5.3
APERTURE EXTRACTION SYSTEMS FOR MEDIUM PLASMA DENSITY . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . . 79 1. ANALYTICAL MODEL FOR A
TWO-ELECTRODE SYSTEM . . . 80 2. CIRCULAR THREE ELECTRODE EXTRACTION
SYSTEM . . . . 83 3. SLIT EXTRACTION SYSTEM . . . . . . . . . . . . . .
. . . . . 86 4. FOUR ELECTRODE EXTRACTION SYSTEM . . . . . . . . . . .
89 3.5.4 EXPANSION CUP EXTRACTION SYSTEM FOR HIGH PLASMA DENSITY . . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . 90 1. SOME
PROPERTIES OF A DI*USING PLASMA . . . . . . . . 90 2. EXTRACTION SYSTEM
OF A DUOPLASMATRON SOURCE . . . 92 3.5.5 LARGE-AREA MULTI-APERTURE
EXTRACTION SYSTEMS . . . . 95 1. MULTI-APERTURE BEAM FOCUSING BY
APERTURE DISPLACEMENT . . . . . . . . . . . . . . . . . . . . . . . . .
96 2. POWER LOADING OF THE ELECTRODES . . . . . . . . . . . . 100 3.5.6
GRID-CONTROLLED EXTRACTION SYSTEM . . . . . . . . . . . . . 101 3.6
RESEARCH METHODS OF EXTRACTION SYSTEMS . . . . . . . . . . . . . 103
3.6.1 EXPERIMENTAL RESEARCH . . . . . . . . . . . . . . . . . . . . .
103 3.6.2 ANALYTICAL APPROACHES TO BEAM OPTICS . . . . . . . . . . 103
3.6.3 NUMERICAL SIMULATIONS . . . . . . . . . . . . . . . . . . . . .
104 1. PHYSICAL MODELS . . . . . . . . . . . . . . . . . . . . . . . 104
2. PHYSICAL EQUATIONS . . . . . . . . . . . . . . . . . . . . . 106 3.
SOME RESULTS . . . . . . . . . . . . . . . . . . . . . . . . . 108 XIII
3.7 SOME OTHER PROBLEMS . . . . . . . . . . . . . . . . . . . . . . . .
. . 110 3.7.1 TRANSVERSE MAGNETIC FIELD E*ECTS ON ION EXTRACTION . 110
3.7.2 TECHNOLOGICAL PROBLEMS OF EXTRACTION SYSTEMS . . . . . 111 1.
SUPPRESSION OF BREAKDOWN IN THE LATERAL EXTRACTION ION SOURCE . . . . .
. . . . . . . . . . . . . . 111 2. SOME TECHNOLOGICAL PROBLEMS . . . . .
. . . . . . . . . 112 REFERENCES . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . . . . . . . . 113 4 POSITIVE ION SOURCES 116 4.1
CLASSI*CATION OF ION SOURCES . . . . . . . . . . . . . . . . . . . . . .
116 4.2 HOT CATHODES . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . 118 4.2.1 REQUIREMENTS AND TYPES OF HOT CATHODES . . . . . .
. . 118 4.2.2 CATHODE MATERIAL AND LIFETIME . . . . . . . . . . . . . .
. 119 4.2.3 E*ECTS OF DISCHARGE CURRENT . . . . . . . . . . . . . . . .
. 122 4.2.4 MAGNETIC FIELD E*ECTS OF THE FILAMENT CURRENT . . . . 122
4.2.5 PLASMA CATHODES . . . . . . . . . . . . . . . . . . . . . . . .
123 4.3 ARC SOURCE IN A UNIFORM MAGNETIC FIELD . . . . . . . . . . . . .
. 125 4.4 HOT-CATHODE PENNING SOURCE . . . . . . . . . . . . . . . . . .
. . . 131 4.4.1 SIMPLE PRINCIPLE . . . . . . . . . . . . . . . . . . . .
. . . . . 131 4.4.2 TYPICAL STRUCTURES . . . . . . . . . . . . . . . . .
. . . . . . . 134 4.5 DUOPLASMATRON ION SOURCE . . . . . . . . . . . . .
. . . . . . . . . . 135 4.5.1 GENERAL PRINCIPLE . . . . . . . . . . . .
. . . . . . . . . . . . 135 4.5.2 FORMATION OF THE CONSTRICTION DOUBLE
SHEATH . . . . . . 137 4.5.3 PRIMARY PARAMETERS . . . . . . . . . . . .
. . . . . . . . . . 138 4.5.4 HEAVY ION DUOPLASMATRON SOURCE . . . . . .
. . . . . . . . 141 4.6 HOT-CATHODE FREEMAN SOURCE . . . . . . . . . .
. . . . . . . . . . 142 4.7 BROAD BEAM ION SOURCES . . . . . . . . . . .
. . . . . . . . . . . . . 144 4.8 COLD-CATHODE PIG SOURCE . . . . . . .
. . . . . . . . . . . . . . . . 148 4.8.1 PRINCIPLES OF A COLD-CATHODE
PENNING DISCHARGE . . . . 148 4.8.1 COLD-CATHODE PIG SOURCES . . . . . .
. . . . . . . . . . . . 149 4.9 RADIO-FREQUENCY ION SOURCE . . . . . . .
. . . . . . . . . . . . . . . 153 4.9.1 PRINCIPLE OF AN RF DISCHARGE . .
. . . . . . . . . . . . . . . 153 4.9.2 MAGNETIC FIELD E*ECTS AND
STRUCTURES . . . . . . . . . . . 157 4.9.3 HEAVY ION RF SOURCES . . . .
. . . . . . . . . . . . . . . . . 159 1. METALLIC ION RF SOURCES . . . .
. . . . . . . . . . . . . . 159 2. RF ION SOURCE FOR ION THRUSTERS . . .
. . . . . . . . . 161 3. RF TRITIUM ION SOURCE . . . . . . . . . . . . .
. . . . . . 162 4.9.4 BEAM CURRENT MODULATION FROM RF SOURCES . . . . .
. . 162 4.10 TECHNOLOGY OF HEAVY ION SOURCES . . . . . . . . . . . . . .
. . . . . 163 4.10.1 SPECIAL REQUIREMENTS FOR HEAVY ION SOURCES . . . .
. . . 163 4.10.2 TYPES OF HEAVY ION SOURCES . . . . . . . . . . . . . .
. . . 164 4.10.3 SURFACE IONIZATION AND THERMIONIC EMISSION SOURCE . 165
4.10.4 HIGH FIELD ION SOURCE . . . . . . . . . . . . . . . . . . . . .
168 1. GAS FIELD IONIZATION SOURCE . . . . . . . . . . . . . . . 169 2.
LIQUID METAL ION SOURCE . . . . . . . . . . . . . . . . . . 170 XIV
4.10.5 FEED MATERIAL . . . . . . . . . . . . . . . . . . . . . . . . . .
. 174 4.10.6 METHODS OF VAPOR TRANSPORT . . . . . . . . . . . . . . . .
. 176 4.10.7 DESIGN AND OPERATION OF HEAVY ION SOURCES . . . . . . . 179
REFERENCES . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . 182 5 GIANT ION SOURCES 187 5.1 DUOPIGATRON ION SOURCE . . .
. . . . . . . . . . . . . . . . . . . . . 188 5.1.1 ESSENTIAL PRINCIPLE
. . . . . . . . . . . . . . . . . . . . . . . . 188 5.1.2 IMPROVEMENT OF
THE PLASMA UNIFORMITY . . . . . . . . . . 190 5.1.3 TYPICAL RESULTS . .
. . . . . . . . . . . . . . . . . . . . . . . . 193 5.2 PERIPLASMATRON
ION SOURCE . . . . . . . . . . . . . . . . . . . . . . . 196 5.3
MULTI*LAMENT ION SOURCE . . . . . . . . . . . . . . . . . . . . . . . .
197 5.3.1 ESSENTIAL PRINCIPLE . . . . . . . . . . . . . . . . . . . . .
. . . 197 5.3.2 MULTI*LAMENTS AND MULTISLOT EXTRACTION ELECTRODE . . 199
5.3.3 IONIZATION E*CIENCY . . . . . . . . . . . . . . . . . . . . . .
200 5.3.4 TYPICAL RESULTS . . . . . . . . . . . . . . . . . . . . . . .
. . . 201 5.4 MAGNETIC MULTIPOLE ION SOURCE . . . . . . . . . . . . . .
. . . . . . 203 5.4.1 GENERAL DESCRIPTION . . . . . . . . . . . . . . .
. . . . . . . . 203 5.4.2 MAGNETIC MULTIPOLE (MULTICUSP) FIELD . . . . .
. . . . . . 204 1. CON*NEMENT PRINCIPLE OF A CUSPED FIELD . . . . . . .
204 2. MAGNETIC FIELD CON*GURATION . . . . . . . . . . . . . . 206 3.
INFLUENCE OF OTHER PARAMETERS . . . . . . . . . . . . . . 209 5.4.3
TYPICAL RESULTS AND APPLICATIONS . . . . . . . . . . . . . . 212 5.5
HALL ACCELERATOR . . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . 213 5.6 CLUSTER ION SOURCE . . . . . . . . . . . . . . . . . . . . .
. . . . . . . 216 5.7 INTENSE PULSED ION SOURCE . . . . . . . . . . . .
. . . . . . . . . . . . 218 5.7.1 REFLEX TRIODE . . . . . . . . . . . .
. . . . . . . . . . . . . . . 219 5.7.2 MAGNETICALLY INSULATED ION DIODE
. . . . . . . . . . . . . . 220 5.7.3 ANODE PLASMA AND STRUCTURE . . . .
. . . . . . . . . . . . . 222 REFERENCES . . . . . . . . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . 225 6 MULTIPLY CHARGED ION
SOURCES 229 6.1 INTRODUCTION . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . 229 6.2 FORMATION OF MULTIPLY CHARGED IONS . . . . .
. . . . . . . . . . . . 231 6.2.1 PHYSICAL DE*NITIONS FOR MULTIPLE
IONIZATION . . . . . . . 231 1. IONIZATION POTENTIAL . . . . . . . . . .
. . . . . . . . . . . 231 2. TOTAL AND PARTIAL IONIZATION CROSS SECTION
. . . . . . 232 3. DISTRIBUTION OF CHARGE STATES AND AVERAGE CHARGE
STATE . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 233
6.2.2 FORMATION OF MULTIPLY CHARGED IONS . . . . . . . . . . . . 233 1.
MULTIPLE IONIZATION BY SINGLE COLLISIONS . . . . . . . . 233 2. STEPWISE
SINGLE IONIZATION OF IONS . . . . . . . . . . . 235 3. STEPWISE MULTIPLE
IONIZATION OF IONS . . . . . . . . . . 238 4. IONIZATION OF METASTABLE
ATOMS OR IONS . . . . . . . . 238 6.2.3 LOSS PROCESSES OF MULTIPLY
CHARGED IONS . . . . . . . . . 239 XV 1. LOSS BY CHARGE TRANSFER . . . .
. . . . . . . . . . . . . . 239 2. LOSS BY RECOMBINATION . . . . . . . .
. . . . . . . . . . 240 3. LOSS BY DI*USION . . . . . . . . . . . . . .
. . . . . . . . 241 6.2.4 BALANCE EQUATIONS FOR ION CHARGE STATES . . .
. . . . . . 243 6.2.5 MULTIPLY CHARGED ION GENERATION BY STRIPPING OF
FAST IONS . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
246 6.3 MAJOR RESEARCH OF MCIS . . . . . . . . . . . . . . . . . . . . .
. . . 246 6.4 MULTIPLY CHARGED ELECTRON BEAM ION SOURCE . . . . . . . .
. . . 249 6.4.1 ELECTRON BEAM ION SOURCE . . . . . . . . . . . . . . . .
. . . 249 1. TYPICAL STRUCTURE . . . . . . . . . . . . . . . . . . . . .
. 249 2. ESSENTIAL PRINCIPLE AND RESULTS . . . . . . . . . . . . . 251
6.4.2 ELECTRON BEAM ION TRAP . . . . . . . . . . . . . . . . . . . . 255
6.4.3 TIME-OF-FLIGHT EBIS (TOFEBIS) . . . . . . . . . . . . . . 256 6.5
CONVENTIONAL MULTIPLY CHARGED ION SOURCES . . . . . . . . . . . . 256
6.5.1 PENNING MULTICHARGED ION SOURCE . . . . . . . . . . . . . . 256 1.
INTRODUCTION, TYPES, AND TYPICAL STRUCTURES . . . . 256 2. THE ESSENTIAL
PRINCIPLE OF GENERATING MULTIPLY CHARGED IONS IN A PIG SOURCE . . . . .
. . . . . . . . . 257 3. EXPERIMENTAL RESULTS . . . . . . . . . . . . .
. . . . . . . 258 6.5.2 DUOPLASMATRON MCIS . . . . . . . . . . . . . . .
. . . . . . 261 6.5.3 OTHER PLASMA DISCHARGE MCIS . . . . . . . . . . .
. . . . 263 1. RADIO-FREQUENCY ION SOURCE . . . . . . . . . . . . . . .
263 2. ELECTROSTATIC OSCILLATING ELECTRON ION SOURCE . . . . 263 3.
TRAPPED ION SOURCE . . . . . . . . . . . . . . . . . . . . . 264 6.6
MICROWAVE ION SOURCES . . . . . . . . . . . . . . . . . . . . . . . . .
. 264 6.6.1 ELECTRON CYCLOTRON RESONANCE MULTIPLY CHARGED ION SOURCE . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 264 1.
DEVELOPMENT AND TYPICAL STRUCTURE . . . . . . . . . . 264 2. ESSENTIAL
PRINCIPLES AND RESULTS . . . . . . . . . . . . . 268 6.6.2 HIGH
INTENSITY MICROWAVE ION SOURCE . . . . . . . . . . . 277 1. CAVITY TYPE
MICROWAVE ION SOURCE . . . . . . . . . . 277 2. ANTENNA TYPE MICROWAVE
ION SOURCE . . . . . . . . . 281 3. HIGH-INTENSITY MICROWAVE PROTON
SOURCE . . . . . . . 282 6.6.3 HOT ELECTRON LAYER ION SOURCE (HELIOS) .
. . . . . . . 284 6.6.4 BEAM-PLASMA ION SOURCE . . . . . . . . . . . . .
. . . . . . 285 6.7 HIGH DENSITY PLASMA SOURCES . . . . . . . . . . . .
. . . . . . . . . 286 6.7.1 LASER MULTIPLY CHARGED ION SOURCE . . . . .
. . . . . . . 286 6.7.2 METAL VAPOR VACUUM ARC ION SOURCES . . . . . . .
. . . . 292 6.7.3 VACUUM SPARK ION SOURCE . . . . . . . . . . . . . . .
. . . . 297 REFERENCES . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . . . 297 7 MASS AND ENERGY SPECTRA OF ION SOURCES 304
7.1 MASS SPECTRA OF A HYDROGEN ION SOURCE . . . . . . . . . . . . . .
304 7.1.1 PHYSICAL PROCESSES E*ECTING THE MASS SPECTRA . . . . . 305 XVI
7.1.2 PARTICLE BALANCE EQUATIONS FOR DETERMINING THE MASS SPECTRA . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . 310 7.1.3 PROTON
CONTENT OF AN RF ION SOURCE . . . . . . . . . . . . 313 7.1.4 MASS
SPECTRA OF A MAGNETIC MULTIPOLE ION SOURCE . . . 314 7.1.5 MASS SPECTRA
OF A DUOPLASMATRON ION SOURCE . . . . . . 315 7.1.6 MASS SPECTRA OF A
HOT-CATHODE PIG ION SOURCE . . . . 316 7.1.7 MASS SPECTRA OF A
COLD-CATHODE PIG ION SOURCE . . . 317 7.2 ENERGY SPECTRA OF ION SOURCES
. . . . . . . . . . . . . . . . . . . . . 318 7.2.1 PHYSICAL CAUSE OF
THE ENERGY SPREAD . . . . . . . . . . . 318 7.2.2 ENERGY SPECTRA OF AN
RF ION SOURCE . . . . . . . . . . . . 319 7.2.3 ENERGY SPECTRA OF OTHER
ION SOURCES . . . . . . . . . . . 322 REFERENCES . . . . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . . . . . 323 8 NEGATIVE ION
SOURCES 325 8.1 INTRODUCTION . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . 325 8.1.1 ELECTRON A*NITY . . . . . . . . . . . . .
. . . . . . . . . . . . 325 8.1.2 HISTORICAL DEVELOPMENT . . . . . . . .
. . . . . . . . . . . . 326 8.2 NEGATIVE ION FORMATION PROCESSES . . . .
. . . . . . . . . . . . . . 327 8.3 VOLUME FORMATION OF NEGATIVE IONS .
. . . . . . . . . . . . . . . . 328 8.3.1 H * FORMATION BY ELECTRON
IMPACT . . . . . . . . . . . . . 328 8.3.2 NEGATIVE ION FORMATION BY
MULTIPLE CHARGE-TRANSFER . 332 8.4 SURFACE FORMATION OF NEGATIVE IONS .
. . . . . . . . . . . . . . . . 338 8.4.1 WORK-FUNCTION OF SURFACES . .
. . . . . . . . . . . . . . . . . 338 8.4.2 SURFACE SPUTTERING . . . . .
. . . . . . . . . . . . . . . . . . . 342 1. ESSENTIAL PRINCIPLE . . . .
. . . . . . . . . . . . . . . . . 343 2. DISTRIBUTIONS OF SPUTTERED
PARTICLES . . . . . . . . . . 347 8.4.3 PARTICLE REFLECTION FROM A SOLID
SURFACE . . . . . . . . . . 348 1. ESSENTIAL PRINCIPLES . . . . . . . .
. . . . . . . . . . . . . 348 2. PARAMETER DEPENDENCE OF REFLECTION . .
. . . . . . . . 349 3. DISTRIBUTION OF REFLECTED PARTICLES . . . . . . .
. . . . 350 8.4.4 SECONDARY ION EMISSION . . . . . . . . . . . . . . . .
. . . . 352 1. GENERAL PRINCIPLES . . . . . . . . . . . . . . . . . . .
. . . 352 2. H * ION FORMATION BY PARTICLE AND SURFACE INTERACTION . . .
. . . . . . . . . . . . . . . . . . . . . . . . 355 3. OTHER NEGATIVE
IONS FORMED BY SPUTTERING . . . . . 356 8.4.5 NEGATIVE SURFACE
IONIZATION . . . . . . . . . . . . . . . . . . 357 8.5 DESTRUCTION OF
NEGATIVE IONS . . . . . . . . . . . . . . . . . . . . . . 358 8.5.1
DESTRUCTION PROCESSES OF NEGATIVE IONS . . . . . . . . . . 358 8.5.2
CROSS-SECTIONS OF H * DESTRUCTION . . . . . . . . . . . . . . 359 8.6
VOLUME H * ION SOURCE . . . . . . . . . . . . . . . . . . . . . . . . .
. 361 8.6.1 DUOPLASMATRON NEGATIVE ION SOURCES . . . . . . . . . . . 361
8.6.2 PENNING NEGATIVE ION SOURCES . . . . . . . . . . . . . . . . 363
8.6.3 MAGNETICALLY FILTERED MULTICUSP VOLUME SOURCES . . . . 364 1.
ESSENTIAL PRINCIPLE . . . . . . . . . . . . . . . . . . . . . 364 2.
MAGNETIC FILTER . . . . . . . . . . . . . . . . . . . . . . . . 364 XVII
3. DEPENDENCE ON VARIOUS PARAMETERS . . . . . . . . . . 366 4. CESIUM
SEEDED MULTICUSP H * SOURCE . . . . . . . . . 368 5. GIANT H * ION
SOURCES . . . . . . . . . . . . . . . . . . . 368 8.6.4 OTHER VOLUME
PRODUCTION NEGATIVE ION SOURCES . . . . 371 8.6.5 H * ION EXTRACTION AND
ELECTRON SUPPRESSION . . . . . . 372 8.7 SURFACE-PLASMA H * ION SOURCES
. . . . . . . . . . . . . . . . . . . . 374 8.7.1 MAGNETRON H * ION
SOURCES . . . . . . . . . . . . . . . . . . 374 8.7.2 PENNING
SURFACE-PLASMA H * ION SOURCES . . . . . . . . . 377 8.7.3 MAGNETIC
CUSPED SURFACE-PLASMA H * SOURCES . . . . . 381 8.7.4 HOLLOW DISCHARGE
DUOPLASMATRON H * SOURCES . . . . . 382 8.8 CHARGE-TRANSFER NEGATIVE ION
SOURCES . . . . . . . . . . . . . . . . 384 8.8.1 EXCHANGE TARGET . . .
. . . . . . . . . . . . . . . . . . . . . . 384 8.8.2 CHARGE-TRANSFER H
* ION SOURCES . . . . . . . . . . . . . . 385 1. RADIO FREQUENCY
NEGATIVE ION SOURCE . . . . . . . . . 385 2. POWERFUL CHARGE-TRANSFER H
* ION SOURCES . . . . . . 386 8.8.3 HE * ION SOURCE . . . . . . . . . .
. . . . . . . . . . . . . . . . 387 8.8.4 OTHER CHARGE-TRANSFER HEAVY
NEGATIVE ION SOURCES . . 387 8.9 CESIUM SPUTTER NEGATIVE ION SOURCES . .
. . . . . . . . . . . . . . 388 8.9.1 MIDDLETON CESIUM SPUTTER SOURCE
(UNIS) . . . . . . . . 388 8.9.2 CESIATED PLASMA SPUTTER NEGATIVE ION
SOURCES . . . . . 391 1. RADIAL EXTRACTION SPUTTERING PENNING NEGATIVE
ION SOURCE . . . . . . . . . . . . . . . . . . . . . . . . . . . 391 2.
SELF-EXTRACTION PLASMA-SPUTTERING NEGATIVE ION SOURCE . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . 392 8.9.3 UNIVERSAL HIGH
INTENSITY CESIUM SPUTTER NEGATIVE ION SOURCES . . . . . . . . . . . . .
. . . . . . . . . . . . . . . . . . 395 8.10 DISSOCIATIVE SOURCE BY
POSITIVE ION IMPACT . . . . . . . . . . . . 397 8.11 SURFACE NEGATIVE
IONIZATION ION SOURCES . . . . . . . . . . . . . . 397 REFERENCES . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 398
9 SELF-NEUTRALIZATION OF BEAM SPACE CHARGE 404 9.1 SELF-NEUTRALIZATION
OF POSITIVE BEAMS . . . . . . . . . . . . . . . . 404 9.2 DYNAMIC
DECOMPENSATION OF THE BEAM SPACE CHARGE . . . . . 410 REFERENCES . . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 415 10
BEAM DIAGNOSTICS FOR ION SOURCES 416 10.1 INTRODUCTION . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . . . 416 10.2 BEAM CURRENT
MEASUREMENTS . . . . . . . . . . . . . . . . . . . . . 417 10.2.1
ELECTRIC METHODS INTERCEPTING THE BEAM . . . . . . . . . 417 1. DC
CURRENT MEASUREMENT BY A FARADAY CUP . . . . 417 2. PULSED CURRENT
MEASUREMENT BY A FARADAY CUP . . 420 10.2.2 CALORIMETRIC METHODS . . . .
. . . . . . . . . . . . . . . . . 421 1. ESSENTIAL PRINCIPLES OF
CALORIMETRIC METHODS . . . . 421 2. FLOW CALORIMETER . . . . . . . . . .
. . . . . . . . . . . . 422 3. STEM CALORIMETER . . . . . . . . . . . .
. . . . . . . . . . 423 XVIII 4. CALORIMETER IN AN ISOTHERMAL MODE . . .
. . . . . . . 424 10.2.3 MAGNETIC-CONDUCTION PROBE FOR PULSED BEAMS . .
. . . 424 10.2.4 RESIDUAL GAS IONIZATION CHAMBER . . . . . . . . . . . .
. 425 10.3 BEAM DENSITY PRO*LE MEASUREMENTS . . . . . . . . . . . . . .
. . . 425 10.3.1 MECHANICAL BEAM PRO*LE SCANNER . . . . . . . . . . . .
. . 427 10.3.2 SEGMENTED WIRE (OR TARGET) . . . . . . . . . . . . . . .
. . 429 10.3.3 ELECTRIC OR MAGNETIC SCANNER . . . . . . . . . . . . . .
. . . 431 10.3.4 OTHER METHODS . . . . . . . . . . . . . . . . . . . . .
. . . . . 431 10.4 BEAM EMITTANCE MEASUREMENTS . . . . . . . . . . . . .
. . . . . . . 432 10.4.1 PHYSICAL CONCEPT OF BEAM EMITTANCE MEASUREMENT
. . 432 10.4.2 PRINCIPLE AND ERRORS OF EMITTANCE MEASUREMENT . . . . 436
10.4.3 VARIOUS EMITTANCE DEVICES . . . . . . . . . . . . . . . . . . 440
1. PEPPER-POT EMITTANCE PROBE . . . . . . . . . . . . . 440 2.
MECHANICAL SCANNER . . . . . . . . . . . . . . . . . . . . . 441 3.
ELECTRIC (MAGNETIC) SCANNER . . . . . . . . . . . . . . . 442 4.
SLIT-MULTIPLE COLLECTOR DEVICE . . . . . . . . . . . . . . 444 5. THREE
BEAM WIDTHS METHOD . . . . . . . . . . . . . 444 10.5 ION ENERGY
SPECTRA MEASUREMENTS . . . . . . . . . . . . . . . . . . 446 10.5.1
CYLINDRICAL ELECTROSTATIC ENERGY ANALYZER . . . . . . . . 447 10.5.2
RETARDING FIELD ENERGY ANALYZER . . . . . . . . . . . . . . 449 10.6
MASS OR CHARGE SPECTRA MEASUREMENTS . . . . . . . . . . . . . . . 452
10.6.1 UMFORM MAGNETIC FIELD ANALYZER . . . . . . . . . . . . . . 453
10.6.2 E * B MASS SEPARATOR . . . . . . . . . . . . . . . . . . . . .
454 10.6.3 TIME-OF-FLIGHT SPECTROMETER . . . . . . . . . . . . . . . . .
457 REFERENCES . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . 459 APPENDIX 462 A1. PHYSICAL CONSTANTS . . . . . . . .
. . . . . . . . . . . . . . . . . . . . 462 A2. COMMON USITS AND
CONVERSION FACTORS . . . . . . . . . . . . . . . 463 A3. DENSITIES,
MELTING POINTS, BOILING POINTS, VAPOR PRESSURE, SOME SOURCE FEED
COMPOUNDS . . . . . . . . . . . . . . . . . . . . 464 A4. WORK-FUNCTION,
FIRST AND STEPWISE IONIZATION POTENTIAL, ELECTRON A*NITY OF THE ELEMENTS
. . . . . . . . . . . . . . . . . . . 468 A5. THE CALCULATED VALUES OF
THE STEPWISE IONIZATION POTENTIAL OF NOBLE GASES . . . . . . . . . . . .
. . . . . . . . . . . . 472 A6. THE MINIMUM WORKFUNCTIONS OF AMORPHOUS
SURFACES WITH ADSORBATE MATERIALS AT OPTIMUM LAYER . . . . . . . . . . .
472 A7. SOLUTION OF THE PLASMA-SHEATH EQUATION . . . . . . . . . . . . .
. 473 INDEX 474
|
any_adam_object | 1 |
author | Zhang, Huashun |
author_facet | Zhang, Huashun |
author_role | aut |
author_sort | Zhang, Huashun |
author_variant | h z hz |
building | Verbundindex |
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classification_rvk | UN 6420 |
ctrlnum | (OCoLC)174530566 (DE-599)BVBBV012727132 |
dewey-full | 539.7/3 |
dewey-hundreds | 500 - Natural sciences and mathematics |
dewey-ones | 539 - Modern physics |
dewey-raw | 539.7/3 |
dewey-search | 539.7/3 |
dewey-sort | 3539.7 13 |
dewey-tens | 530 - Physics |
discipline | Physik |
format | Book |
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id | DE-604.BV012727132 |
illustrated | Illustrated |
indexdate | 2024-07-09T18:32:38Z |
institution | BVB |
isbn | 3540657479 7030073517 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008653328 |
oclc_num | 174530566 |
open_access_boolean | |
owner | DE-20 DE-634 DE-384 DE-11 |
owner_facet | DE-20 DE-634 DE-384 DE-11 |
physical | XVIII, 476 S. Ill., graph. Darst. |
publishDate | 1999 |
publishDateSearch | 1999 |
publishDateSort | 1999 |
publisher | Science Press [u.a.] |
record_format | marc |
spelling | Zhang, Huashun Verfasser aut Ion sources Huashun Zhang Beijing [u.a.] Science Press [u.a.] 1999 XVIII, 476 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Ionenquelle (DE-588)4162341-1 gnd rswk-swf Ionenquelle (DE-588)4162341-1 s DE-604 SWB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008653328&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
spellingShingle | Zhang, Huashun Ion sources Ionenquelle (DE-588)4162341-1 gnd |
subject_GND | (DE-588)4162341-1 |
title | Ion sources |
title_auth | Ion sources |
title_exact_search | Ion sources |
title_full | Ion sources Huashun Zhang |
title_fullStr | Ion sources Huashun Zhang |
title_full_unstemmed | Ion sources Huashun Zhang |
title_short | Ion sources |
title_sort | ion sources |
topic | Ionenquelle (DE-588)4162341-1 gnd |
topic_facet | Ionenquelle |
url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008653328&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
work_keys_str_mv | AT zhanghuashun ionsources |