VLSI Technology: Fundamentals and Applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Berlin, Heidelberg
Springer Berlin Heidelberg
1986
|
| Schriftenreihe: | Springer Series in Electrophysics
12 |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | The origin of the development of integrated circuits up to VLSI is found in the invention of the transistor, which made it possible to achieve the action of a vacuum tube in a semiconducting solid. The structure of the transistor can be constructed by a manufacturing technique such as the introduction of a small amount of an impurity into a semiconductor and, in addition, most transistor characteristics can be improved by a reduction of dimensions. These are all important factors in the development. Actually, the microfabrication of the integrated circuit can be used for two purposes, namely to increase the integration density and to obtain an improved performance, e. g. a high speed. When one of these two aims is pursued, the result generally satisfies both. We use the English translation "very large scale integration ("VLSI" for "Cho LSI" in Japanese. In the United States of America, however, similar technology is being developed under the name "very high speed integrated circuits (VHSI). This also originated from the nature of the integrated circuit which satisfies both purposes. Fortunately, the Japanese word "Cho LSI" has a wider meaning than VLSI, so it can be used ina broader area. However, VLSI has a larger industrial effect than VHSI. |
| Beschreibung: | 1 Online-Ressource (XIV, 450 p) |
| ISBN: | 9783642691928 9783642691942 |
| ISSN: | 0172-5734 |
| DOI: | 10.1007/978-3-642-69192-8 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV042413412 | ||
| 003 | DE-604 | ||
| 005 | 20170918 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150316s1986 |||| o||u| ||||||eng d | ||
| 020 | |a 9783642691928 |c Online |9 978-3-642-69192-8 | ||
| 020 | |a 9783642691942 |c Print |9 978-3-642-69194-2 | ||
| 024 | 7 | |a 10.1007/978-3-642-69192-8 |2 doi | |
| 035 | |a (OCoLC)863801143 | ||
| 035 | |a (DE-599)BVBBV042413412 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-83 | ||
| 082 | 0 | |a 621.381 |2 23 | |
| 084 | |a PHY 000 |2 stub | ||
| 100 | 1 | |a Tarui, Yasuo |d 1929- |e Verfasser |0 (DE-588)1024268942 |4 aut | |
| 245 | 1 | 0 | |a VLSI Technology |b Fundamentals and Applications |c edited by Yasuo Tarui |
| 264 | 1 | |a Berlin, Heidelberg |b Springer Berlin Heidelberg |c 1986 | |
| 300 | |a 1 Online-Ressource (XIV, 450 p) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 1 | |a Springer Series in Electrophysics |v 12 |x 0172-5734 | |
| 500 | |a The origin of the development of integrated circuits up to VLSI is found in the invention of the transistor, which made it possible to achieve the action of a vacuum tube in a semiconducting solid. The structure of the transistor can be constructed by a manufacturing technique such as the introduction of a small amount of an impurity into a semiconductor and, in addition, most transistor characteristics can be improved by a reduction of dimensions. These are all important factors in the development. Actually, the microfabrication of the integrated circuit can be used for two purposes, namely to increase the integration density and to obtain an improved performance, e. g. a high speed. When one of these two aims is pursued, the result generally satisfies both. We use the English translation "very large scale integration ("VLSI" for "Cho LSI" in Japanese. In the United States of America, however, similar technology is being developed under the name "very high speed integrated circuits (VHSI). This also originated from the nature of the integrated circuit which satisfies both purposes. Fortunately, the Japanese word "Cho LSI" has a wider meaning than VLSI, so it can be used ina broader area. However, VLSI has a larger industrial effect than VHSI. | ||
| 650 | 4 | |a Engineering | |
| 650 | 4 | |a Software engineering | |
| 650 | 4 | |a Electronics | |
| 650 | 4 | |a Electronics and Microelectronics, Instrumentation | |
| 650 | 4 | |a Special Purpose and Application-Based Systems | |
| 650 | 4 | |a Ingenieurwissenschaften | |
| 650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 830 | 0 | |a Springer Series in Electrophysics |v 12 |w (DE-604)BV000000013 |9 12 | |
| 856 | 4 | 0 | |u https://doi.org/10.1007/978-3-642-69192-8 |x Verlag |3 Volltext |
| 912 | |a ZDB-2-PHA |a ZDB-2-BAE | ||
| 940 | 1 | |q ZDB-2-PHA_Archive | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027848905 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804153077629976576 |
|---|---|
| any_adam_object | |
| author | Tarui, Yasuo 1929- |
| author_GND | (DE-588)1024268942 |
| author_facet | Tarui, Yasuo 1929- |
| author_role | aut |
| author_sort | Tarui, Yasuo 1929- |
| author_variant | y t yt |
| building | Verbundindex |
| bvnumber | BV042413412 |
| classification_tum | PHY 000 |
| collection | ZDB-2-PHA ZDB-2-BAE |
| ctrlnum | (OCoLC)863801143 (DE-599)BVBBV042413412 |
| dewey-full | 621.381 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381 |
| dewey-search | 621.381 |
| dewey-sort | 3621.381 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1007/978-3-642-69192-8 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03014nmm a2200493zcb4500</leader><controlfield tag="001">BV042413412</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20170918 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s1986 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783642691928</subfield><subfield code="c">Online</subfield><subfield code="9">978-3-642-69192-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783642691942</subfield><subfield code="c">Print</subfield><subfield code="9">978-3-642-69194-2</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-3-642-69192-8</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863801143</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042413412</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Tarui, Yasuo</subfield><subfield code="d">1929-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)1024268942</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">VLSI Technology</subfield><subfield code="b">Fundamentals and Applications</subfield><subfield code="c">edited by Yasuo Tarui</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Berlin, Heidelberg</subfield><subfield code="b">Springer Berlin Heidelberg</subfield><subfield code="c">1986</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XIV, 450 p)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Springer Series in Electrophysics</subfield><subfield code="v">12</subfield><subfield code="x">0172-5734</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">The origin of the development of integrated circuits up to VLSI is found in the invention of the transistor, which made it possible to achieve the action of a vacuum tube in a semiconducting solid. The structure of the transistor can be constructed by a manufacturing technique such as the introduction of a small amount of an impurity into a semiconductor and, in addition, most transistor characteristics can be improved by a reduction of dimensions. These are all important factors in the development. Actually, the microfabrication of the integrated circuit can be used for two purposes, namely to increase the integration density and to obtain an improved performance, e. g. a high speed. When one of these two aims is pursued, the result generally satisfies both. We use the English translation "very large scale integration ("VLSI" for "Cho LSI" in Japanese. In the United States of America, however, similar technology is being developed under the name "very high speed integrated circuits (VHSI). This also originated from the nature of the integrated circuit which satisfies both purposes. Fortunately, the Japanese word "Cho LSI" has a wider meaning than VLSI, so it can be used ina broader area. However, VLSI has a larger industrial effect than VHSI.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Software engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics and Microelectronics, Instrumentation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Special Purpose and Application-Based Systems</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ingenieurwissenschaften</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Springer Series in Electrophysics</subfield><subfield code="v">12</subfield><subfield code="w">(DE-604)BV000000013</subfield><subfield code="9">12</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-3-642-69192-8</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027848905</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| id | DE-604.BV042413412 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:20:52Z |
| institution | BVB |
| isbn | 9783642691928 9783642691942 |
| issn | 0172-5734 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027848905 |
| oclc_num | 863801143 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | 1 Online-Ressource (XIV, 450 p) |
| psigel | ZDB-2-PHA ZDB-2-BAE ZDB-2-PHA_Archive |
| publishDate | 1986 |
| publishDateSearch | 1986 |
| publishDateSort | 1986 |
| publisher | Springer Berlin Heidelberg |
| record_format | marc |
| series | Springer Series in Electrophysics |
| series2 | Springer Series in Electrophysics |
| spelling | Tarui, Yasuo 1929- Verfasser (DE-588)1024268942 aut VLSI Technology Fundamentals and Applications edited by Yasuo Tarui Berlin, Heidelberg Springer Berlin Heidelberg 1986 1 Online-Ressource (XIV, 450 p) txt rdacontent c rdamedia cr rdacarrier Springer Series in Electrophysics 12 0172-5734 The origin of the development of integrated circuits up to VLSI is found in the invention of the transistor, which made it possible to achieve the action of a vacuum tube in a semiconducting solid. The structure of the transistor can be constructed by a manufacturing technique such as the introduction of a small amount of an impurity into a semiconductor and, in addition, most transistor characteristics can be improved by a reduction of dimensions. These are all important factors in the development. Actually, the microfabrication of the integrated circuit can be used for two purposes, namely to increase the integration density and to obtain an improved performance, e. g. a high speed. When one of these two aims is pursued, the result generally satisfies both. We use the English translation "very large scale integration ("VLSI" for "Cho LSI" in Japanese. In the United States of America, however, similar technology is being developed under the name "very high speed integrated circuits (VHSI). This also originated from the nature of the integrated circuit which satisfies both purposes. Fortunately, the Japanese word "Cho LSI" has a wider meaning than VLSI, so it can be used ina broader area. However, VLSI has a larger industrial effect than VHSI. Engineering Software engineering Electronics Electronics and Microelectronics, Instrumentation Special Purpose and Application-Based Systems Ingenieurwissenschaften VLSI (DE-588)4117388-0 gnd rswk-swf VLSI (DE-588)4117388-0 s 1\p DE-604 Springer Series in Electrophysics 12 (DE-604)BV000000013 12 https://doi.org/10.1007/978-3-642-69192-8 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Tarui, Yasuo 1929- VLSI Technology Fundamentals and Applications Springer Series in Electrophysics Engineering Software engineering Electronics Electronics and Microelectronics, Instrumentation Special Purpose and Application-Based Systems Ingenieurwissenschaften VLSI (DE-588)4117388-0 gnd |
| subject_GND | (DE-588)4117388-0 |
| title | VLSI Technology Fundamentals and Applications |
| title_auth | VLSI Technology Fundamentals and Applications |
| title_exact_search | VLSI Technology Fundamentals and Applications |
| title_full | VLSI Technology Fundamentals and Applications edited by Yasuo Tarui |
| title_fullStr | VLSI Technology Fundamentals and Applications edited by Yasuo Tarui |
| title_full_unstemmed | VLSI Technology Fundamentals and Applications edited by Yasuo Tarui |
| title_short | VLSI Technology |
| title_sort | vlsi technology fundamentals and applications |
| title_sub | Fundamentals and Applications |
| topic | Engineering Software engineering Electronics Electronics and Microelectronics, Instrumentation Special Purpose and Application-Based Systems Ingenieurwissenschaften VLSI (DE-588)4117388-0 gnd |
| topic_facet | Engineering Software engineering Electronics Electronics and Microelectronics, Instrumentation Special Purpose and Application-Based Systems Ingenieurwissenschaften VLSI |
| url | https://doi.org/10.1007/978-3-642-69192-8 |
| volume_link | (DE-604)BV000000013 |
| work_keys_str_mv | AT taruiyasuo vlsitechnologyfundamentalsandapplications |