Analytical electron microscopy for materials science:
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English Japanese |
| Veröffentlicht: |
Tokyo [u.a.]
Springer
2002
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| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | IX, 152 S. zahlr. Ill. und graph. Darst. |
| ISBN: | 4431703365 |
Internformat
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| 245 | 1 | 0 | |a Analytical electron microscopy for materials science |c D. Shindo ; T. Oikawa |
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| 300 | |a IX, 152 S. |b zahlr. Ill. und graph. Darst. | ||
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Datensatz im Suchindex
| _version_ | 1821501331123208192 |
|---|---|
| adam_text |
D. SHINDO * T. OIKAWA ANALYTICAL ELECTRON MICROSCOPY FOR MATERIALS
SCIENCE WITH 180 FIGURES SPRINGER CONTENTS PREFACE V 1. BASIC PRINCIPLES
OF ANALYTICAL ELECTRON MICROSCOPY 1.1 INTERACTION BETWEEN ELECTRONS AND
MATERIALS 1 1.1.1 SCATTERING OF ELECTRONS 1 1.1.2 FUNDAMENTAL QUANTITIES
CHARACTERIZING ELECTRON SCATTERING 1 1.1.3 SIMULATION OF SCATTERING
PROCESS 4 1.2 INELASTIC ELECTRON SCATTERING AND ANALYTICAL ELECTRON
MICROSCOPY 6 1.2.1 OUTLINE OF ELECTRON ENERGY-LOSS SPECTROSCOPY AND
ENERGY DISPERSIVE X-RAY SPECTROSCOPY 6 1.2.2 ANALYTICAL ELECTRON
MICROSCOPY AND MATERIALS CHARACTERIZATION 8 1.3 HARDWARE CONTROLLED BY
COMPUTER AND MANAGEMENT OF ANALYTICAL DATA 9 REFERENCES 11 2.
CONSTITUTION AND BASIC OPERATION OF ANALYTICAL ELECTRON MICROSCOPES 2.1
BASIC CONSTITUTION OF ANALYTICAL ELECTRON MICROSCOPES . 13 2.1.1
ELECTRON GUN : 13 2.1.2 HIGH VOLTAGE GENERATOR AND ACCELERATION TUBE 18
2.1.3 ILLUMINATION LENS SYSTEM AND A DEFLECTOR 19 2.1.4 SPECIMEN HOLDERS
20 2.1.5 IMAGE-FORMING LENS SYSTEM 22 2.1.6 VIEWING CHAMBER AND CAMERA
CHAMBER (IMAGE RECORDING SYSTEM) . 27 2.2 OPERATION OF TRANSMISSION
ELECTRON MICROSCOPES 35 2.2.1 ALIGNMENT OF LENSES AND ASTIGMATISM
CORRECTION . 35 2.2.2 FOCUS ADJUSTMENT OF THE OBJECTIVE LENS 39
REFERENCES 40 3. ELECTRON ENERGY-LOSS SPECTROSCOPY 3.1 INELASTIC
SCATTERING OF ELECTRONS 43 3.2 SPECTROMETER FOR EELS 44 3.2.1 ENERGY
DISPERSION 44 3.2.2 SPECTROMETER OPTICS 44 3.2.3 SERIAL DETECTION AND
PARALLEL DETECTION 45 3.2.4 COMPENSATION OF EXTERNAL MAGNETIC FIELD 47
3.3 ANALYTICAL TECHNIQUE IN EELS 48 3.3.1 ACCELERATING VOLTAGE 48 3.3.2
ACCEPTANCE ANGLE 48 3.3.3 ANALYTICAL MODES 50 VIII CONTENTS 3.3.4
DETECTION LIMIT IN EELS 50 3.4 THEORETICAL BACKGROUND OF EELS 50 3.5
ANALYSIS OF ELECTRON ENERGY-LOSS SPECTRA 53 3.5.1 ENERGY LOSS DUE TO
PLASMON EXCITATION 53 3.5.2 MEASUREMENT OF MEAN FREE PATH OF INELASTIC
SCATTERING AND ESTIMATION OF SPECIMEN THICKNESS . 55 3.5.3 ENERGY LOSS
DUE TO INNER-SHELL ELECTRON EXCITATION 57 3.6 PRINCIPLES AND APPLICATION
OF ENERGY FILTERING 67 3.6.1 ELECTRON OPTICS OF ENERGY FILTER 67 3.6.2
ENERGY FILTERS AND THEIR FEATURES 68 3.6.3 ANALYTICAL TECHNIQUE AND
APPLICATION OF ENERGY FILTER 72 REFERENCES 78 4. ENERGY DISPERSIVE X-RAY
SPECTROSCOPY 4.1 EMISSION OF CHARACTERISTIC X-RAYS 81 4.2 X-RAY
DETECTORS AND THEIR PRINCIPLES 83 4.2.1 BERYLLIUM WINDOW TYPE 83 4.2.2
ULTRA-THIN WINDOW TYPE 84 4.3 ANALYTICAL TECHNIQUE FOR EDS 85 4.3.1
DETECTION OF X-RAYS 85 4.3.2 SPATIAL RESOLUTION 86 4.3.3 PEAK/BACKGROUND
RATIO 86 4.3.4 ELEMENTAL MAPPING METHOD 86 4.3.5 DETECTION LIMIT OF EDS
87 4.4 QUANTITATIVE ANALYSIS 89 4.4.1 K-FACTOR 89 4.4.2 PRACTICE IN
QUANTITATIVE ANALYSIS 89 4.5 NOTICE OF QUANTITATIVE ANALYSIS 90 4.5.1
ABSORPTION OF X-RAYS BY A SPECIMEN 90 4.5.2 STATISTICAL ERROR 91 4.5.3
ESCAPE PEAK, SUM PEAK, AND OTHERS 91 4.5.4 CRYSTALLINE SPECIMENS 91 4.6
ALCHEMI 93 4.6.1 PRINCIPLE 93 4.6.2 DETERMINATION OF SITE OCCUPANCY BY
ALCHEMI . 97 4.6.3 ACCURACY AND NOTICE OF ALCHEMI 99 APPENDIX 100
REFERENCES 101 5. PERIPHERAL INSTRUMENTS AND TECHNIQUES FOR ANALYTICAL
ELECTRON MICROSCOPY 5.1 ELECTRON DIFFRACTION 103 5.1.1 NANO-BEAM
ELECTRON DIFFRACTION 103 5.1.2 CONVERGENT BEAM ELECTRON DIFFRACTION 103
5.2 LORENTZ MICROSCOPY 109 5.2.1 PRINCIPLES . 110 5.2.2 FRESNEL METHOD
(DEFOCUSING METHOD) ILL 5.2.3 FOUCAULT METHOD (IN-FOCUS METHOD) 113 5.3
ELECTRON HOLOGRAPHY 116 5.3.1 PRINCIPLES 116 5.3.2 PRACTICE OF ELECTRON
HOLOGRAPHY 118 CONTENTS IX 5.4 SCANNING ELECTRON MICROSCOPY 125 5.4.1
PRINCIPLES AND APPLICATION OF SEM 126 5.4.2 HIGH-ANGLE SCATTERED
DARK-FIELD STEM 129 5.5 SPECIMEN PREPARATION TECHNIQUES 129 5.5.1
CRUSHING METHOD 130 5.5.2 ELECTROPOLISHING 130 5.5.3 CHEMICAL POLISHING
131 5.5.4 ULTRAMICROTOMY 131 5.5.5 ION MILLING 133 5.5.6 FOCUSED ION
BEAM 133 5.5.7 VACUUM EVAPORATION 134 5.5.8 OBSERVATION OF SPECIMENS 134
REFERENCES 135 APPENDIX A: PHYSICAL CONSTANTS, CONVERSION FACTORS,
ELECTRON WAVELENGTHS 137 APPENDIX B: ELECTRON BINDING ENERGIES AND
CHARACTERISTIC X-RAY ENERGIES 139 APPENDIX C: VACUUM SYSTEM 145 INDEX
147 NOTES PRINCIPLE OF ELECTRON LENS ACTION 25 HIGH VOLTAGE WOBBLER AND
IMAGE WOBBLER 38 ABERRATION OF AN ENERGY FILTER AND ISOCHROMATICITY .
.'-. 69 QUANTUM NUMBERS SPECIFYING THE ENERGY LEVELS OF ATOMIC ELECTRONS
82 BRAGG CONDITION AND HIGHER-ORDER DIFFRACTION 109 THREE-DIMENSIONAL
INFORMATION AND STEREOMICROSCOPY 120 EFFECT OF PHASE SHIFT DUE TO INNER
POTENTIAL AND MAGNETIC FIELD ON A HOLOGRAM AND A RECONSTRUCTED PHASE
IMAGE . . . .' 123 |
| any_adam_object | 1 |
| author | Shindo, Daisuke 1953- Oikawa, Tetsuo |
| author_GND | (DE-588)120559463 |
| author_facet | Shindo, Daisuke 1953- Oikawa, Tetsuo |
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| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
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| dewey-search | 620.11299 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Chemie Werkstoffwissenschaften |
| format | Book |
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| indexdate | 2025-01-17T13:03:56Z |
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| isbn | 4431703365 |
| language | English Japanese |
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| physical | IX, 152 S. zahlr. Ill. und graph. Darst. |
| publishDate | 2002 |
| publishDateSearch | 2002 |
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| publisher | Springer |
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| spelling | Shindo, Daisuke 1953- Verfasser (DE-588)120559463 aut Analytical electron microscopy for materials science D. Shindo ; T. Oikawa Tokyo [u.a.] Springer 2002 IX, 152 S. zahlr. Ill. und graph. Darst. txt rdacontent n rdamedia nc rdacarrier Electron microscopy Materials Microscopy Durchstrahlungselektronenmikroskopie (DE-588)4215608-7 gnd rswk-swf Durchstrahlungselektronenmikroskopie (DE-588)4215608-7 s DE-604 Oikawa, Tetsuo Verfasser aut GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=010050157&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Shindo, Daisuke 1953- Oikawa, Tetsuo Analytical electron microscopy for materials science Electron microscopy Materials Microscopy Durchstrahlungselektronenmikroskopie (DE-588)4215608-7 gnd |
| subject_GND | (DE-588)4215608-7 |
| title | Analytical electron microscopy for materials science |
| title_auth | Analytical electron microscopy for materials science |
| title_exact_search | Analytical electron microscopy for materials science |
| title_full | Analytical electron microscopy for materials science D. Shindo ; T. Oikawa |
| title_fullStr | Analytical electron microscopy for materials science D. Shindo ; T. Oikawa |
| title_full_unstemmed | Analytical electron microscopy for materials science D. Shindo ; T. Oikawa |
| title_short | Analytical electron microscopy for materials science |
| title_sort | analytical electron microscopy for materials science |
| topic | Electron microscopy Materials Microscopy Durchstrahlungselektronenmikroskopie (DE-588)4215608-7 gnd |
| topic_facet | Electron microscopy Materials Microscopy Durchstrahlungselektronenmikroskopie |
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