Lithium sputtering, deposition and evaporation: controlled thin film engineering
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
Saarbrücken
VDM
2008
|
| Schlagworte: | |
| Beschreibung: | VIII, 178 S. Ill., graph. Darst. |
| ISBN: | 3639041895 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV036079411 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 100315s2008 ad|| m||| 00||| eng d | ||
| 020 | |a 3639041895 |9 3-639-04189-5 | ||
| 035 | |a (OCoLC)287269319 | ||
| 035 | |a (DE-599)BVBBV036079411 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-19 | ||
| 050 | 0 | |a TA480.L5 | |
| 082 | 0 | |a 620.44 |b N397l |2 22 | |
| 100 | 1 | |a Neumann, Martin J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Lithium sputtering, deposition and evaporation |b controlled thin film engineering |c Martin J. Neumann |
| 264 | 1 | |a Saarbrücken |b VDM |c 2008 | |
| 300 | |a VIII, 178 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 502 | |a Zugl.: Urbana, Ill., Univ., Diss. | ||
| 650 | 4 | |a Lithium | |
| 650 | 4 | |a Sputtering (Physics) | |
| 650 | 4 | |a Thin films | |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-018970510 | ||
Datensatz im Suchindex
| _version_ | 1804141135901229056 |
|---|---|
| any_adam_object | |
| author | Neumann, Martin J. |
| author_facet | Neumann, Martin J. |
| author_role | aut |
| author_sort | Neumann, Martin J. |
| author_variant | m j n mj mjn |
| building | Verbundindex |
| bvnumber | BV036079411 |
| callnumber-first | T - Technology |
| callnumber-label | TA480 |
| callnumber-raw | TA480.L5 |
| callnumber-search | TA480.L5 |
| callnumber-sort | TA 3480 L5 |
| callnumber-subject | TA - General and Civil Engineering |
| ctrlnum | (OCoLC)287269319 (DE-599)BVBBV036079411 |
| dewey-full | 620.44 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.44 |
| dewey-search | 620.44 |
| dewey-sort | 3620.44 |
| dewey-tens | 620 - Engineering and allied operations |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01019nam a2200337 c 4500</leader><controlfield tag="001">BV036079411</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">100315s2008 ad|| m||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3639041895</subfield><subfield code="9">3-639-04189-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)287269319</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV036079411</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-19</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TA480.L5</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620.44</subfield><subfield code="b">N397l</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Neumann, Martin J.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Lithium sputtering, deposition and evaporation</subfield><subfield code="b">controlled thin film engineering</subfield><subfield code="c">Martin J. Neumann</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Saarbrücken</subfield><subfield code="b">VDM</subfield><subfield code="c">2008</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VIII, 178 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="a">Zugl.: Urbana, Ill., Univ., Diss.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithium</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Sputtering (Physics)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-018970510</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV036079411 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T22:11:04Z |
| institution | BVB |
| isbn | 3639041895 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018970510 |
| oclc_num | 287269319 |
| open_access_boolean | |
| owner | DE-19 DE-BY-UBM |
| owner_facet | DE-19 DE-BY-UBM |
| physical | VIII, 178 S. Ill., graph. Darst. |
| publishDate | 2008 |
| publishDateSearch | 2008 |
| publishDateSort | 2008 |
| publisher | VDM |
| record_format | marc |
| spelling | Neumann, Martin J. Verfasser aut Lithium sputtering, deposition and evaporation controlled thin film engineering Martin J. Neumann Saarbrücken VDM 2008 VIII, 178 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Zugl.: Urbana, Ill., Univ., Diss. Lithium Sputtering (Physics) Thin films (DE-588)4113937-9 Hochschulschrift gnd-content |
| spellingShingle | Neumann, Martin J. Lithium sputtering, deposition and evaporation controlled thin film engineering Lithium Sputtering (Physics) Thin films |
| subject_GND | (DE-588)4113937-9 |
| title | Lithium sputtering, deposition and evaporation controlled thin film engineering |
| title_auth | Lithium sputtering, deposition and evaporation controlled thin film engineering |
| title_exact_search | Lithium sputtering, deposition and evaporation controlled thin film engineering |
| title_full | Lithium sputtering, deposition and evaporation controlled thin film engineering Martin J. Neumann |
| title_fullStr | Lithium sputtering, deposition and evaporation controlled thin film engineering Martin J. Neumann |
| title_full_unstemmed | Lithium sputtering, deposition and evaporation controlled thin film engineering Martin J. Neumann |
| title_short | Lithium sputtering, deposition and evaporation |
| title_sort | lithium sputtering deposition and evaporation controlled thin film engineering |
| title_sub | controlled thin film engineering |
| topic | Lithium Sputtering (Physics) Thin films |
| topic_facet | Lithium Sputtering (Physics) Thin films Hochschulschrift |
| work_keys_str_mv | AT neumannmartinj lithiumsputteringdepositionandevaporationcontrolledthinfilmengineering |