Micro Process and Quality Control of Plasma Spraying:
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Singapore
Springer Nature Singapore
2022
Singapore Springer |
| Ausgabe: | 1st ed. 2022 |
| Schriftenreihe: | Springer Series in Advanced Manufacturing
|
| Schlagworte: | |
| Online-Zugang: | BTU01 FAB01 FAW01 FHA01 FHD01 FHI01 FHM01 FHN01 FHR01 FKE01 FLA01 FRO01 FWS01 FWS02 HTW01 TUM01 UBY01 UER01 Volltext |
| Beschreibung: | 1 Online-Ressource (XII, 669 p. 535 illus., 359 illus. in color) |
| ISBN: | 9789811927423 |
| ISSN: | 2196-1735 |
| DOI: | 10.1007/978-981-19-2742-3 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV048496084 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 221004s2022 |||| o||u| ||||||eng d | ||
| 020 | |a 9789811927423 |c Online |9 978-981-1927-42-3 | ||
| 024 | 7 | |a 10.1007/978-981-19-2742-3 |2 doi | |
| 035 | |a (ZDB-2-ENG)9789811927423 | ||
| 035 | |a (OCoLC)1347214054 | ||
| 035 | |a (DE-599)BVBBV048496084 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-860 |a DE-91 |a DE-1046 |a DE-1043 |a DE-Aug4 |a DE-898 |a DE-861 |a DE-523 |a DE-859 |a DE-29 |a DE-863 |a DE-1050 |a DE-862 |a DE-92 |a DE-573 |a DE-M347 |a DE-706 |a DE-634 | ||
| 082 | 0 | |a 620.11 |2 23 | |
| 082 | 0 | |a 667.9 |2 23 | |
| 084 | |a ELT 000 |2 stub | ||
| 084 | |a MAS 000 |2 stub | ||
| 100 | 1 | |a Ma, Guozheng |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Micro Process and Quality Control of Plasma Spraying |c by Guozheng Ma, Shuying Chen, Haidou Wang |
| 250 | |a 1st ed. 2022 | ||
| 264 | 1 | |a Singapore |b Springer Nature Singapore |c 2022 | |
| 264 | 1 | |a Singapore |b Springer | |
| 300 | |a 1 Online-Ressource (XII, 669 p. 535 illus., 359 illus. in color) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Springer Series in Advanced Manufacturing |x 2196-1735 | |
| 650 | 4 | |a Coatings | |
| 650 | 4 | |a Plasma processing | |
| 650 | 4 | |a Thermal Process Engineering | |
| 650 | 4 | |a Surface and Interface and Thin Film | |
| 650 | 4 | |a Coatings | |
| 650 | 4 | |a Plasma (Ionized gases) | |
| 650 | 4 | |a Production engineering | |
| 650 | 4 | |a Surfaces (Physics) | |
| 700 | 1 | |a Chen, Shuying |4 aut | |
| 700 | 1 | |a Wang, Haidou |4 aut | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-981-1927-41-6 |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-981-1927-43-0 |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-981-1927-44-7 |
| 856 | 4 | 0 | |u https://doi.org/10.1007/978-981-19-2742-3 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-2-ENG | ||
| 940 | 1 | |q ZDB-2-ENG_2022 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-033873439 | ||
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l BTU01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FAB01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FAW01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHA01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHD01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHI01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHM01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHN01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FHR01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FKE01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FLA01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FRO01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FWS01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l FWS02 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l HTW01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l TUM01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l UBY01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
| 966 | e | |u https://doi.org/10.1007/978-981-19-2742-3 |l UER01 |p ZDB-2-ENG |x Verlag |3 Volltext | |
Datensatz im Suchindex
| DE-BY-FWS_katkey | 1007326 |
|---|---|
| _version_ | 1806174545830215680 |
| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | Ma, Guozheng Chen, Shuying Wang, Haidou |
| author_facet | Ma, Guozheng Chen, Shuying Wang, Haidou |
| author_role | aut aut aut |
| author_sort | Ma, Guozheng |
| author_variant | g m gm s c sc h w hw |
| building | Verbundindex |
| bvnumber | BV048496084 |
| classification_tum | ELT 000 MAS 000 |
| collection | ZDB-2-ENG |
| ctrlnum | (ZDB-2-ENG)9789811927423 (OCoLC)1347214054 (DE-599)BVBBV048496084 |
| dewey-full | 620.11 667.9 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations 667 - Cleaning, color & coating technologies |
| dewey-raw | 620.11 667.9 |
| dewey-search | 620.11 667.9 |
| dewey-sort | 3620.11 |
| dewey-tens | 620 - Engineering and allied operations 660 - Chemical engineering |
| discipline | Chemie / Pharmazie Elektrotechnik Maschinenbau |
| discipline_str_mv | Chemie / Pharmazie Elektrotechnik Maschinenbau |
| doi_str_mv | 10.1007/978-981-19-2742-3 |
| edition | 1st ed. 2022 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03723nmm a2200769zcb4500</leader><controlfield tag="001">BV048496084</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">221004s2022 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9789811927423</subfield><subfield code="c">Online</subfield><subfield code="9">978-981-1927-42-3</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-981-19-2742-3</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-2-ENG)9789811927423</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1347214054</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV048496084</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-860</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-1046</subfield><subfield code="a">DE-1043</subfield><subfield code="a">DE-Aug4</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-861</subfield><subfield code="a">DE-523</subfield><subfield code="a">DE-859</subfield><subfield code="a">DE-29</subfield><subfield code="a">DE-863</subfield><subfield code="a">DE-1050</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-573</subfield><subfield code="a">DE-M347</subfield><subfield code="a">DE-706</subfield><subfield code="a">DE-634</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620.11</subfield><subfield code="2">23</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">667.9</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">MAS 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Ma, Guozheng</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Micro Process and Quality Control of Plasma Spraying</subfield><subfield code="c">by Guozheng Ma, Shuying Chen, Haidou Wang</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1st ed. 2022</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Singapore</subfield><subfield code="b">Springer Nature Singapore</subfield><subfield code="c">2022</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Singapore</subfield><subfield code="b">Springer</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XII, 669 p. 535 illus., 359 illus. in color)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Springer Series in Advanced Manufacturing</subfield><subfield code="x">2196-1735</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Coatings</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma processing</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thermal Process Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Surface and Interface and Thin Film</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Coatings</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma (Ionized gases)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Production engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Surfaces (Physics)</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chen, Shuying</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Wang, Haidou</subfield><subfield code="4">aut</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-981-1927-41-6</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-981-1927-43-0</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-981-1927-44-7</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-ENG</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-ENG_2022</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-033873439</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">BTU01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FAB01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHA01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHI01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHM01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHN01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FHR01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FKE01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FLA01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FRO01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FWS01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">FWS02</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">HTW01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">TUM01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">UBY01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-981-19-2742-3</subfield><subfield code="l">UER01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV048496084 |
| illustrated | Not Illustrated |
| index_date | 2024-07-03T20:43:18Z |
| indexdate | 2024-08-01T10:51:14Z |
| institution | BVB |
| isbn | 9789811927423 |
| issn | 2196-1735 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-033873439 |
| oclc_num | 1347214054 |
| open_access_boolean | |
| owner | DE-860 DE-91 DE-BY-TUM DE-1046 DE-1043 DE-Aug4 DE-898 DE-BY-UBR DE-861 DE-523 DE-859 DE-29 DE-863 DE-BY-FWS DE-1050 DE-862 DE-BY-FWS DE-92 DE-573 DE-M347 DE-706 DE-634 |
| owner_facet | DE-860 DE-91 DE-BY-TUM DE-1046 DE-1043 DE-Aug4 DE-898 DE-BY-UBR DE-861 DE-523 DE-859 DE-29 DE-863 DE-BY-FWS DE-1050 DE-862 DE-BY-FWS DE-92 DE-573 DE-M347 DE-706 DE-634 |
| physical | 1 Online-Ressource (XII, 669 p. 535 illus., 359 illus. in color) |
| psigel | ZDB-2-ENG ZDB-2-ENG_2022 |
| publishDate | 2022 |
| publishDateSearch | 2022 |
| publishDateSort | 2022 |
| publisher | Springer Nature Singapore Springer |
| record_format | marc |
| series2 | Springer Series in Advanced Manufacturing |
| spellingShingle | Ma, Guozheng Chen, Shuying Wang, Haidou Micro Process and Quality Control of Plasma Spraying Coatings Plasma processing Thermal Process Engineering Surface and Interface and Thin Film Plasma (Ionized gases) Production engineering Surfaces (Physics) |
| title | Micro Process and Quality Control of Plasma Spraying |
| title_auth | Micro Process and Quality Control of Plasma Spraying |
| title_exact_search | Micro Process and Quality Control of Plasma Spraying |
| title_exact_search_txtP | Micro Process and Quality Control of Plasma Spraying |
| title_full | Micro Process and Quality Control of Plasma Spraying by Guozheng Ma, Shuying Chen, Haidou Wang |
| title_fullStr | Micro Process and Quality Control of Plasma Spraying by Guozheng Ma, Shuying Chen, Haidou Wang |
| title_full_unstemmed | Micro Process and Quality Control of Plasma Spraying by Guozheng Ma, Shuying Chen, Haidou Wang |
| title_short | Micro Process and Quality Control of Plasma Spraying |
| title_sort | micro process and quality control of plasma spraying |
| topic | Coatings Plasma processing Thermal Process Engineering Surface and Interface and Thin Film Plasma (Ionized gases) Production engineering Surfaces (Physics) |
| topic_facet | Coatings Plasma processing Thermal Process Engineering Surface and Interface and Thin Film Plasma (Ionized gases) Production engineering Surfaces (Physics) |
| url | https://doi.org/10.1007/978-981-19-2742-3 |
| work_keys_str_mv | AT maguozheng microprocessandqualitycontrolofplasmaspraying AT chenshuying microprocessandqualitycontrolofplasmaspraying AT wanghaidou microprocessandqualitycontrolofplasmaspraying |