On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems:
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
Dresden
TUDpress
2012
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| Schlagworte: | |
| Online-Zugang: | Inhaltstext Inhaltsverzeichnis |
| Beschreibung: | XXVI, 186 Seiten Illustrationen, Diagramme 21 cm |
| ISBN: | 9783942710657 |
Internformat
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Datensatz im Suchindex
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IMAGE 1
CONTENTS
LIST O F FIGURES XIV
LIST O F TABLES XIX
LIST O F S Y M B O L S XXI
LIST O F ABBREVIATIONS XXV
1 INTRODUCTION 1
1.1 NANOIMPRINT LITHOGRAPHY 2
1.2 DIRECT-PATTERNING BY NANOIINPRINTING 4
] .3 SCOPE A N D STRUCTURE OF THIS WORK 7
BASICS 9
2 BASICS O F P O L Y M E R ADHESION A N D SILANE MONOLAYERS 1 1
2.1 LNTERMOIECULAR FORCES 12
2.2 SURFACE ENERGY, WORK OF COHESION, WORK OF ADHESION 14
2.3 MEASUREMENT OF SURFACE ENERGIES 14
2.4 ADHESION MODELS 20
2.4.1 ELECTROSTATIC T H E O R Y 20
2.4.2 MECHANICAL T H E O R Y 20
2.4.3 DIFFUSION T H E O R Y 21
2.4.4 ADSORPTION T H E O R Y 22
2.4.5 COVALENT BONDING 2 3
2.5 IMPORTANCE OF ADHESION FOR NIL 25
2.6 ADHESION PROMOTION 25
2.7 ADHESION PREVENTION 26
2.7.1 SILANE ANTISTICKING LAYERS 26
2.7.2 POLYMERIC ANTISTICKING MEASURES 26
2.7.3 METALIC ANTISTICKING LAYERS 27
2.7.4 O T H E R ANTISTICKING MEASURES 27
2.8 SILANE MONOLAYER PREPARATION 28
2.8.1 LIQUID DEPOSITION 30
2.8.2 VAPOR PHASE DEPOSITION 31
2.9 CHARACTERIZATION OF MONOLAYERS 31
2.9.1 SURFACE FREE ENERGY 31
X I
HTTP://D-NB.INFO/1021674087
IMAGE 2
CONTENTS
2.9.2 PHOTOELECTRON SPECTROSCOPY 32
2.9.3 STABILITY OF SILANE LAYERS 38
2.9.4 ANTIDEGRADATION MEASURES 40
3 BASICS O F L I T H O G R A P H Y FOR FUNCTIONAL P O L Y M E R W A V E
G U I D E S 4 1
3.1 P L A N A R POLYMER WAVEGUIDES 42
3.2 PHOTOLITHOGRAPHY 4 3
3.3 NANOIMPRINTING 45
3.3.1 T H E R M A L NANOIMPRINT LITHOGRAPHY (T-NIL) 46
3.3.2 UV-ASSISTED NANOIMPRINTLITHOGRAPHY (UV-NIL) 4 7
3.3.3 HYBRID TECHNIQUES 48
3.3.4 RESIDUAL POLYMER LAYER 51
3.3.5 MONOLITHIC MOLDS 52
3.3.6 BONDED MOLDS 54
3.4 FUNCTIONAL SURFACES A N D NIL 57
3.4.1 FUNCTIONAL GROUPS FOR BIOCONJUGATION 57
3.4.2 POST-IMPRINT T R E A T M E N T 58
3.4.3 INCORPORATION OF FUNCTIONAL ADDITIVES 59
3.4.4 UV-NIL MATERIAL REQUIREMENTS 61
EXPERIMENTAL RESULTS 6 3
4 TECHNOLOGY C O M P O N E N T S FOR UV-NIL 6 5
4.1 ANTISTICKING LAYERS 66
4.1.1 F D T S - C V D S E T U P 66
4.1.2 PROPERTIES OF F D T S - C V D LAYERS 68
4.1.3 STABILITY OF F D T S - C V D LAYERS 73
4.1.4 ALUMINUM OXIDE AS ANTISTICKING LAYER 79
4.2 HYDROXYL-FUNCTIONAL IMPRINT POLYMER 82
4.2.1 IMPRINT MATERIAL FORMULATION 82
4.2.2 SPECIMEN P R E P A R A T I O N FOR CHARACTERIZATION 84
4.2.3 CHARACTERIZATION OF FUNCTIONAL POLYMER SURFACES 85
4.2.4 OUTLOOK FOR IMPRINTED STRUCTURES 90
4.3 ADHESIVELY BONDED NANOIMPRINT MOLDS 9 1
4.3.1 BIM REQUIREMENTS A N D ADHESIVES 91
4.3.2 INITIAL BOND JOINT S T R E N G T H 94
4.3.3 BOND J O I N T THICKNESS A N D MOLD P L A N A R I T Y 95
4.3.4 CHEMICAL STABILITY 99
4.3.5 PROCESS STABILITY 105
4.3.6 IMPRINTING 106
4.4 UV-NIL TECHNIQUE FOR O P A Q U E MOLDS A N D SUBSTRATES 108
5 UV-NIL T E C H N O L O G Y FOR P O L Y M E R MICRORING R E S O N A T O
R S 1 1 3
5.1 MATERIAL SYSTEM ' 114
X I I
IMAGE 3
CONTENTS
5.2 M R R REPLICATION 118
5.2.1 MOLD MANUFACTURING 118
5.2.2 P A T T E R N TRANSFER T O IMPRINT MATERIAL 119
5.2.3 RESIDUAL LAYER REMOVAL: EFFECTS ON WAVEGUIDES 123
5.3 STAMP-AND-REPEAT UV-NIL 126
5.3.1 UV-NIL DEFECTS 126
5.3.2 STRUCTURE FILLING 133
5.3.3 NEIGHBORING EXPOSURE EFFECTS 136
5.3.4 RESIDUAL LAYER HOMOGENEITY 143
5.4 HYBRID UV-NIL TECHNIQUE ( C N P ) 149
5.4.1 IMPRINTING RESULTS 149
5.4.2 C H R O M I U M LAYER DEGRADATION 151
5.4.3 RESIDUAL LAYER CURING 152
6 CONCLUSION A N D O U T L O O K 1 5 7
6.1 CONCLUSION 157
6.2 OUTLOOK 159
A P P E N D I C E S 1 6 0
A M O D E L FOR T H E FOWKES DISPERSION A P P R O A C H 1 6 3
B DERIVATION O F T H E RELATION O F T H E INITIATOR C O N C E N T R A T
I O N O N S U B S E Q U E N T E X P O
S U R E S 1 6 5
C COEFFICIENTS O F S P E C U L A R REFLECTION FOR T H E INTERFACES B E T
W E E N U V C U R 2 1 S F , S I 0 2 , SI A N D C H R O M I U M A T A = 3
6 5 N M 1 6 7
X I I I |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| spelling | Kirchner, Robert 1981- Verfasser (DE-588)1023379813 aut On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems Robert Kirchner Dresden TUDpress 2012 XXVI, 186 Seiten Illustrationen, Diagramme 21 cm txt rdacontent n rdamedia nc rdacarrier Dissertation Technische Universität Dresden 2011 Photonik (DE-588)4243979-6 gnd rswk-swf Ringresonator (DE-588)4221850-0 gnd rswk-swf Funktionelle Polymere (DE-588)4530052-5 gnd rswk-swf Ultraviolett (DE-588)4186733-6 gnd rswk-swf Nanoprägen (DE-588)7546601-6 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Nanoprägen (DE-588)7546601-6 s Ultraviolett (DE-588)4186733-6 s Funktionelle Polymere (DE-588)4530052-5 s Ringresonator (DE-588)4221850-0 s Photonik (DE-588)4243979-6 s DE-604 X:MVB text/html http://deposit.dnb.de/cgi-bin/dokserv?id=4014552&prov=M&dok_var=1&dok_ext=htm Inhaltstext DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=029665452&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Kirchner, Robert 1981- On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems Photonik (DE-588)4243979-6 gnd Ringresonator (DE-588)4221850-0 gnd Funktionelle Polymere (DE-588)4530052-5 gnd Ultraviolett (DE-588)4186733-6 gnd Nanoprägen (DE-588)7546601-6 gnd |
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| title | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems |
| title_auth | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems |
| title_exact_search | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems |
| title_full | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems Robert Kirchner |
| title_fullStr | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems Robert Kirchner |
| title_full_unstemmed | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems Robert Kirchner |
| title_short | On UV-nanoimprint lithography as direct patterning tool for polymeric microsystems |
| title_sort | on uv nanoimprint lithography as direct patterning tool for polymeric microsystems |
| topic | Photonik (DE-588)4243979-6 gnd Ringresonator (DE-588)4221850-0 gnd Funktionelle Polymere (DE-588)4530052-5 gnd Ultraviolett (DE-588)4186733-6 gnd Nanoprägen (DE-588)7546601-6 gnd |
| topic_facet | Photonik Ringresonator Funktionelle Polymere Ultraviolett Nanoprägen Hochschulschrift |
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