Dual-Gate Nano-FETs auf SOI: grundlegende Prozessschritte
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | German |
| Veröffentlicht: |
Aachen
Shaker
2003
|
| Schriftenreihe: | Berichte aus der Physik
|
| Schlagworte: | |
| Beschreibung: | Zugl.: Aachen, Techn. Hochsch., Diss., 2003 |
| Beschreibung: | 136 S. Ill., graph. Darst. : 21 cm, 207 gr. |
| ISBN: | 3832222405 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV019370096 | ||
| 003 | DE-604 | ||
| 005 | 20060613 | ||
| 007 | t | ||
| 008 | 040820s2003 gw ad|| m||| 00||| ger d | ||
| 016 | 7 | |a 969457821 |2 DE-101 | |
| 020 | |a 3832222405 |c kart. : EUR 45.80 (DE), EUR 45.80 (AT), sfr 91.60 |9 3-8322-2240-5 | ||
| 035 | |a (OCoLC)57170672 | ||
| 035 | |a (DE-599)BVBBV019370096 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a ger | |
| 044 | |a gw |c DE | ||
| 049 | |a DE-91 |a DE-29T | ||
| 082 | 0 | |a 620 | |
| 084 | |a ELT 321f |2 stub | ||
| 100 | 1 | |a Henschel, Wolfgang |d 1970- |e Verfasser |0 (DE-588)128599278 |4 aut | |
| 245 | 1 | 0 | |a Dual-Gate Nano-FETs auf SOI |b grundlegende Prozessschritte |c Wolfgang Henschel |
| 264 | 1 | |a Aachen |b Shaker |c 2003 | |
| 300 | |a 136 S. |b Ill., graph. Darst. : 21 cm, 207 gr. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Berichte aus der Physik | |
| 500 | |a Zugl.: Aachen, Techn. Hochsch., Diss., 2003 | ||
| 650 | 0 | 7 | |a MOS-FET |0 (DE-588)4207266-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a SOI-Technik |0 (DE-588)4128029-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Nanotechnologie |0 (DE-588)4327470-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a MOS-FET |0 (DE-588)4207266-9 |D s |
| 689 | 0 | 1 | |a SOI-Technik |0 (DE-588)4128029-5 |D s |
| 689 | 0 | 2 | |a Nanotechnologie |0 (DE-588)4327470-5 |D s |
| 689 | 0 | 3 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-012833571 | ||
Datensatz im Suchindex
| _version_ | 1804132808789065728 |
|---|---|
| any_adam_object | |
| author | Henschel, Wolfgang 1970- |
| author_GND | (DE-588)128599278 |
| author_facet | Henschel, Wolfgang 1970- |
| author_role | aut |
| author_sort | Henschel, Wolfgang 1970- |
| author_variant | w h wh |
| building | Verbundindex |
| bvnumber | BV019370096 |
| classification_tum | ELT 321f |
| ctrlnum | (OCoLC)57170672 (DE-599)BVBBV019370096 |
| dewey-full | 620 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620 |
| dewey-search | 620 |
| dewey-sort | 3620 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01603nam a2200445 c 4500</leader><controlfield tag="001">BV019370096</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20060613 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">040820s2003 gw ad|| m||| 00||| ger d</controlfield><datafield tag="016" ind1="7" ind2=" "><subfield code="a">969457821</subfield><subfield code="2">DE-101</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3832222405</subfield><subfield code="c">kart. : EUR 45.80 (DE), EUR 45.80 (AT), sfr 91.60</subfield><subfield code="9">3-8322-2240-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)57170672</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV019370096</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">ger</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">gw</subfield><subfield code="c">DE</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 321f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Henschel, Wolfgang</subfield><subfield code="d">1970-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)128599278</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Dual-Gate Nano-FETs auf SOI</subfield><subfield code="b">grundlegende Prozessschritte</subfield><subfield code="c">Wolfgang Henschel</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Aachen</subfield><subfield code="b">Shaker</subfield><subfield code="c">2003</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">136 S.</subfield><subfield code="b">Ill., graph. Darst. : 21 cm, 207 gr.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Berichte aus der Physik</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Zugl.: Aachen, Techn. Hochsch., Diss., 2003</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">MOS-FET</subfield><subfield code="0">(DE-588)4207266-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">SOI-Technik</subfield><subfield code="0">(DE-588)4128029-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Nanotechnologie</subfield><subfield code="0">(DE-588)4327470-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">MOS-FET</subfield><subfield code="0">(DE-588)4207266-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">SOI-Technik</subfield><subfield code="0">(DE-588)4128029-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Nanotechnologie</subfield><subfield code="0">(DE-588)4327470-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="3"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-012833571</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV019370096 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T19:58:43Z |
| institution | BVB |
| isbn | 3832222405 |
| language | German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-012833571 |
| oclc_num | 57170672 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-29T |
| owner_facet | DE-91 DE-BY-TUM DE-29T |
| physical | 136 S. Ill., graph. Darst. : 21 cm, 207 gr. |
| publishDate | 2003 |
| publishDateSearch | 2003 |
| publishDateSort | 2003 |
| publisher | Shaker |
| record_format | marc |
| series2 | Berichte aus der Physik |
| spelling | Henschel, Wolfgang 1970- Verfasser (DE-588)128599278 aut Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte Wolfgang Henschel Aachen Shaker 2003 136 S. Ill., graph. Darst. : 21 cm, 207 gr. txt rdacontent n rdamedia nc rdacarrier Berichte aus der Physik Zugl.: Aachen, Techn. Hochsch., Diss., 2003 MOS-FET (DE-588)4207266-9 gnd rswk-swf SOI-Technik (DE-588)4128029-5 gnd rswk-swf Nanotechnologie (DE-588)4327470-5 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content MOS-FET (DE-588)4207266-9 s SOI-Technik (DE-588)4128029-5 s Nanotechnologie (DE-588)4327470-5 s Elektronenstrahllithografie (DE-588)4151897-4 s DE-604 |
| spellingShingle | Henschel, Wolfgang 1970- Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte MOS-FET (DE-588)4207266-9 gnd SOI-Technik (DE-588)4128029-5 gnd Nanotechnologie (DE-588)4327470-5 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| subject_GND | (DE-588)4207266-9 (DE-588)4128029-5 (DE-588)4327470-5 (DE-588)4151897-4 (DE-588)4113937-9 |
| title | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte |
| title_auth | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte |
| title_exact_search | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte |
| title_full | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte Wolfgang Henschel |
| title_fullStr | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte Wolfgang Henschel |
| title_full_unstemmed | Dual-Gate Nano-FETs auf SOI grundlegende Prozessschritte Wolfgang Henschel |
| title_short | Dual-Gate Nano-FETs auf SOI |
| title_sort | dual gate nano fets auf soi grundlegende prozessschritte |
| title_sub | grundlegende Prozessschritte |
| topic | MOS-FET (DE-588)4207266-9 gnd SOI-Technik (DE-588)4128029-5 gnd Nanotechnologie (DE-588)4327470-5 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| topic_facet | MOS-FET SOI-Technik Nanotechnologie Elektronenstrahllithografie Hochschulschrift |
| work_keys_str_mv | AT henschelwolfgang dualgatenanofetsaufsoigrundlegendeprozessschritte |